Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.59 |
| ▸ | GFER | P55789 | 1/20 | 0.59 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.59 |
| ▸ | POLB | P06746 | 2/20 | 0.57 |
| ▸ | MEN1 | O00255 | 1/20 | 0.57 |
| ▸ | USP2 | O75604 | 1/20 | 0.57 |
| ▸ | MAPT | P10636 | 1/20 | 0.57 |
| ▸ | THRB | P10828 | 1/20 | 0.57 |
| ▸ | PKM | P14618 | 1/20 | 0.57 |
| ▸ | APEX1 | P27695 | 1/20 | 0.57 |
| ▸ | RECQL | P46063 | 1/20 | 0.57 |
| ▸ | BLM | P54132 | 1/20 | 0.57 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.57 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.57 |
| ▸ | GLA | P06280 | 1/20 | 0.55 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.53 |
| ▸ | CDC25B | P30305 | 1/20 | 0.53 |
| ▸ | CASP6 | P55212 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL712251 | 0.98 | KDM4E (0.61) | KMT2AKDM4EGFERRXFP1POLB | |
| SCHEMBL710634 | 0.94 | KMT2A (0.63) | KMT2AKDM4EGFERRXFP1POLB | |
| SCHEMBL5078313 | 0.94 | POLB (0.57) | KMT2AKDM4EGFERRXFP1POLB | |
| SCHEMBL1027446 | 0.94 | KMT2A (0.61) | KMT2AKDM4EGFERRXFP1POLB | |
| SCHEMBL10583194 | 0.91 | BRAF (0.56) | KMT2AKDM4EGFERRXFP1POLB | |
| SCHEMBL2426327 | 0.91 | KEAP1 (0.66) | KMT2AKDM4EGFERRXFP1POLB | |
| SCHEMBL7554668 | 0.91 | KDM4E (0.53) | KMT2AKDM4EGFERRXFP1POLB | |
| SCHEMBL1553285 | 0.91 | KDM4E (0.55) | KMT2AKDM4EGFERRXFP1POLB | |
| SCHEMBL22471783 | 0.90 | KMT2A (0.49) | KMT2AKDM4EGFERRXFP1POLB | |
| SCHEMBL1553291 | 0.88 | POLB (0.58) | KMT2AKDM4EGFERRXFP1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119775947-A | Adhesive, and preparation method and application thereof | 深圳市研一新材料有限责任公司 | 2025-04-08 | — | — | CN | claimed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |
| CN-119775947-A | Adhesive, and preparation method and application thereof | 深圳市研一新材料有限责任公司 | 2025-04-08 | — | — | CN | disclosed |
| CN-119585651-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2025-03-07 | — | — | CN | disclosed |
| WO-2025047700-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025047702-A1 | COMPOSITION FOR PATTERNING AND USE OF SAME | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2024214539-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM, AND COMPOUND | 日産化学株式会社 | 2024-10-17 | — | — | WO | disclosed |
| CN-118525024-A | Condensed ring thiophene compound and composition for forming wavelength conversion film containing same | 国立大学法人东海国立大学机构 | 2024-08-20 | — | — | CN | disclosed |
| CN-118318191-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-118192168-A | Photosensitive resin composition | 日产化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| WO-2024122572-A1 | WAVELENGTH CONVERSION FILM-FORMING COMPOSITION AND FUSED THIOPHENE COMPOUND | 日産化学株式会社 | 2024-06-13 | — | — | WO | disclosed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | disclosed |
| US-20040197699-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1431822-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2004-06-23 | — | — | EP | disclosed |
| US-6677099-B1 | POLYAMIDEIMIDE DEVELOPED BY AN AQUEOUS ALKALINE SOLUTION AND WHICH IS EXCELLENT IN THE DEVELOPABILITY AND THE ADHESION TO A SUBSTRATE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-01-13 | — | — | US | disclosed |
| EP-1329769-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2003-07-23 | — | — | EP | disclosed |
| EP-1241527-A1 | POSITIVE TYPE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2002-09-18 | — | — | EP | disclosed |
| EP-0424940-B1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL IND LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5288588-A | Containing diamine substituted with phenolic hydroxyl, carboxyl, thiophenol and/or sulfonic groups | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1994-02-22 | — | — | US | disclosed |
| EP-0424940-A2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1991-05-02 | — | — | EP | disclosed |