Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 10/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | MLYCD | O95822 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15613896 | 0.86 | CYP1A2 (0.43) | ALDH1A1CYP1A2EPHX2GAACYP3A4 | |
| SCHEMBL15613899 | 0.86 | CYP1A2 (0.43) | ALDH1A1CYP1A2EPHX2GAACYP3A4 | |
| SCHEMBL572949 | 0.85 | TDP1 (0.56) | ALDH1A1CYP1A2GAACYP3A4CYP2C19 | |
| SCHEMBL25349245 | 0.83 | CYP1A2 (0.53) | ALDH1A1CYP1A2EPHX2GAACYP3A4 | |
| SCHEMBL15613908 | 0.81 | PRMT1 (0.46) | EPHX2GAA | |
| Hydrochloric Acid SCHEMBL4415432 | 0.81 | CYP1A2 (0.52) | ALDH1A1CYP1A2EPHX2GAACYP3A4 | |
| SCHEMBL31126988 | 0.81 | EPHX1 (0.55) | ALDH1A1CYP1A2EPHX2GAACYP3A4 | |
| SCHEMBL25095054 | 0.81 | TDP1 (0.58) | ALDH1A1CYP1A2EPHX2GAACYP3A4 | |
| SCHEMBL7158127 | 0.79 | TDP1 (0.61) | ALDH1A1CYP1A2EPHX2GAACYP3A4 | |
| SCHEMBL5653695 | 0.79 | TDP1 (0.61) | ALDH1A1CYP1A2EPHX2GAACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9017922-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-9017922-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20140080055-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-20 | — | — | US | disclosed |
| US-20140080055-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-20 | — | — | US | disclosed |