Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRMT1 | Q99873 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.44 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | EPHX2 | P34913 | 9/20 | 0.41 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15613901 | 0.84 | MEN1 (0.46) | PRMT1HTTMEN1GAAKMT2A | |
| SCHEMBL15613902 | 0.84 | MEN1 (0.46) | PRMT1HTTMEN1GAAKMT2A | |
| SCHEMBL238415 | 0.81 | MEN1 (0.64) | PRMT1HTTMEN1GAAKMT2A | |
| SCHEMBL15613918 | 0.81 | ALDH1A1 (0.46) | GAAEPHX2 | |
| SCHEMBL28063880 | 0.80 | MEN1 (0.62) | PRMT1HTTMEN1GAAKMT2A | |
| SCHEMBL15613938 | 0.79 | ADRA1A (0.49) | PRMT1MEN1GAAKMT2APLA2G4A | |
| SCHEMBL15613928 | 0.78 | ADRA1A (0.51) | PRMT1MEN1GAAKMT2APLA2G4A | |
| SCHEMBL14838226 | 0.77 | TDP1 (0.41) | MEN1GAAKMT2ATDP1 | |
| SCHEMBL628018 | 0.77 | EPHX1 (0.57) | PRMT1HTTPLA2G4AADRA1AEPHX2 | |
| SCHEMBL904074 | 0.76 | TDP1 (0.66) | PRMT1MEN1GAAKMT2AADRA1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9250518-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-9250518-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-20150125794-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-07 | — | — | US | disclosed |
| US-20150125794-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-07 | — | — | US | disclosed |
| US-9017922-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-9017922-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20140080055-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-20 | — | — | US | disclosed |
| US-20140080055-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-20 | — | — | US | disclosed |