⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15866578 | 1.00 | — | — | |
| SCHEMBL28254202 | 0.91 | ACE2 (0.37) | — | |
| SCHEMBL15910175 | 0.87 | GABRR1 (0.46) | — | |
| SCHEMBL31461006 | 0.82 | TSHR (0.39) | — | |
| SCHEMBL3283814 | 0.81 | HSD17B10 (0.54) | — | |
| SCHEMBL17453558 | 0.81 | NAALAD2 (0.38) | — | |
| SCHEMBL15701348 | 0.80 | — | — | |
| SCHEMBL2925468 | 0.80 | — | — | |
| SCHEMBL20835209 | 0.79 | MAPT (0.41) | — | |
| SCHEMBL7081650 | 0.79 | ALDH1A1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 702 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4616684-A1 | LIQUID CRYSTALLINE SAM VIA SPIN-COAT ASSEMBLY AND THEIR AREA SELECTIVE DEPOSITION PROPERTIES | Merck Patent GmbH (DE) | 2025-09-17 | — | — | EP | claimed |
| WO-2024100183-A1 | LIQUID CRYSTALLINE SAM VIA SPIN-COAT ASSEMBLY AND THEIR AREA SELECTIVE DEPOSITION PROPERTIES | MERCK PATENT GMBH (DE) | 2024-05-16 | — | — | WO | claimed |
| CN-115746616-A | Surface-modified hollow silica particles and surface-modified hollow silica dispersion | 凯斯科技股份有限公司 | 2023-03-07 | — | — | CN | claimed |
| EP-3497520-B1 | BOTTOM ANTIREFLECTIVE COATING FORMING COMPOSITION | MERCK PATENT GMBH (DE) | 2020-10-21 | — | — | EP | claimed |
| US-10155879-B2 | Compositions and use thereof for modification of substrate surfaces | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2018-12-18 | — | — | US | claimed |
| US-9952510-B2 | Thinner composition | DONGWOO FINE-CHEM CO., LTD. (KR) | 2018-04-24 | — | — | US | claimed |
| EP-2822050-B1 | CHARGE-TRANSPORTING VARNISH | NISSAN CHEMICAL IND LTD (JP) | 2017-06-14 | — | — | EP | claimed |
| US-20160230129-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2016-08-11 | — | — | US | claimed |
| EP-1798596-B1 | Positive photoresist composition | SHINETSU CHEMICAL CO (JP) | 2012-08-01 | — | — | EP | claimed |
| JP-4804577-B2 | — | — | 2011-11-02 | — | — | JP | claimed |
| US-20100085518-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2010-04-08 | — | — | US | claimed |
| WO-2008102990-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2008-08-28 | — | — | WO | claimed |
| WO-2008078953-A1 | BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME | LG CHEM, LTD. (KR) | 2008-07-03 | — | — | WO | claimed |
| WO-2008068197-A1 | POLYISOCYANATE PREPARATIONS | BASF SE (DE) | 2008-06-12 | — | — | WO | claimed |
| US-20070060729-A1 | Photosensitive resin composition and dry film resist using the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-03-15 | — | — | US | claimed |
| WO-2004099876-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM RESIST USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-11-18 | — | — | WO | claimed |
| EP-1016698-B1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | MITSUBISHI RAYON CO (JP) | 2004-09-22 | — | — | EP | claimed |
| EP-0907108-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2004-01-28 | — | — | EP | claimed |
| EP-0629671-B1 | Solvent composition | MITSUBISHI RAYON CO (JP) | 2002-03-27 | — | — | EP | claimed |
| EP-0408635-B1 | TRANSESTERIFICATION OF ALKOXYESTERS | EASTMAN KODAK CO (US) | 1994-02-23 | — | — | EP | claimed |