SCHEMBL1563579

SCHEMBL1563579

C(OCC1CO1)C1CO1.OCCC(CO)CO

nearest known ligand 0.43

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.43
ALDH1A1 P00352 5/20 0.42
MAPK1 P28482 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.38
TDP1 Q9NUW8 1/20 0.36
TP53 P04637 1/20 0.32
CYP3A4 P08684 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL124924 0.89 ALDH1A1 (0.47) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
SCHEMBL218942 0.87 TSHR (0.50) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Methacrylic Acid SCHEMBL27476395 0.84 ALDH1A1 (0.46) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
SCHEMBL27930316 0.82 TSHR (0.45) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL21445 0.80 TSHR (0.56) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL5448533 0.80 TSHR (0.56) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
SCHEMBL14891221 0.80 ALDH1A1 (0.54) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
SCHEMBL1843155 0.80 TSHR (0.44) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
SCHEMBL6430794 0.79 ALDH1A1 (0.53) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
SCHEMBL14231436 0.79 ALDH1A1 (0.53) TSHRALDH1A1MAPK1SMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114231185-B Seam beautifying agent capable of rapidly curing system and preparation method and application thereof 武汉市科达云石护理材料有限公司 2023-06-02 CN claimed
CN-114231185-A Seam beautifying agent capable of quickly curing system and preparation method and application thereof 武汉市科达云石护理材料有限公司 2022-03-25 CN claimed
CN-109154776-A Chemical amplifying type negative photoresist composition 荣昌化学制品株式会社 2019-01-04 CN claimed
EP-4382315-A1 PNEUMATIC TIRE Sumitomo Rubber Industries, Ltd. (JP) 2024-06-12 EP disclosed
US-20240123765-A1 TIRE SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2024-04-18 US disclosed
CN-117757222-A Epoxy resin composition and application thereof 万华化学集团电子材料有限公司 2024-03-26 CN disclosed
US-20240042813-A1 TIRE SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2024-02-08 US disclosed
US-20230415514-A1 TIRE SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2023-12-28 US disclosed
US-20230416508-A1 TIRE SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2023-12-28 US disclosed
US-20230416507-A1 TIRE SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2023-12-28 US disclosed
US-20230415515-A1 TIRE SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2023-12-28 US disclosed
EP-3053941-A1 TWO-PACK EPOXY RESIN COMPOSITION FOR FIBER-REINFORCED COMPOSITE MATERIAL, AND FIBER-REINFORCED COMPOSITE MATERIAL Toray Industries, Inc. (JP) 2016-08-10 EP disclosed
US-8916327-B2 Underlayer coating forming composition containing dextrin ester compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-12-23 US disclosed
US-20110135939-A1 CONDUCTIVE COATING COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-06-09 US disclosed
EP-2309519-A1 CONDUCTIVE COATING COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2011-04-13 EP disclosed
CN-1894299-B Solvent-free urethane composition CELUSTER PAINT CO LTD 2010-06-23 CN disclosed
EP-1681594-B1 COMPOSITION FOR FORMING UNDERLYING FILM CONTAINING DEXTRIN ESTER COMPOUND NISSAN CHEMICAL IND LTD (JP) 2009-05-13 EP disclosed
US-20070135581-A1 Underlayer coating forming composition containing dextrin ester compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-06-14 US disclosed
CN-1894299-A Solvent-free urethane composition CELUSTER PAINT CO LTD (JP) 2007-01-10 CN disclosed
EP-1681594-A1 COMPOSITION FOR FORMING UNDERLYING FILM CONTAINING DEXTRIN ESTER COMPOUND Nissan Chemical Industries, Ltd. (JP) 2006-07-19 EP disclosed