⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14491287 | 0.85 | CA1 (0.32) | — | |
| SCHEMBL20101700 | 0.75 | CA1 (0.38) | — | |
| SCHEMBL13243400 | 0.72 | S1PR3 (0.36) | — | |
| SCHEMBL13713615 | 0.71 | F2 (0.34) | — | |
| SCHEMBL779510 | 0.70 | CA1 (0.41) | — | |
| SCHEMBL92349 | 0.70 | RIPK1 (0.31) | — | |
| SCHEMBL13131214 | 0.69 | CA1 (0.31) | — | |
| SCHEMBL14278399 | 0.69 | CA1 (0.38) | — | |
| SCHEMBL20101703 | 0.68 | ELANE (0.40) | — | |
| SCHEMBL9963800 | 0.68 | APP (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170059992-A1 | RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-9046782-B2 | Resist composition for negative tone development and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-8709704-B2 | Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method | FUJIFILM CORPORATION (JP) | 2014-04-29 | — | — | US | disclosed |