SCHEMBL157304

SCHEMBL157304

C=CC(=O)C(C)N=C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27916180 0.74
SCHEMBL8856908 0.74
SCHEMBL7605395 0.73 ALDH1A1 (0.32)
SCHEMBL195838 0.71
SCHEMBL485848 0.70
SCHEMBL10658392 0.70
SCHEMBL3496894 0.70
SCHEMBL27799496 0.70 TSHR (0.37)
SCHEMBL8989283 0.70 TSHR (0.31)
SCHEMBL4843693 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 177 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4067403-B1 BLOCKED ISOCYANATE, THERMOSETTING COMPOSITION AND CURED PRODUCT SHINETSU CHEMICAL CO (JP) 2026-04-01 EP disclosed
EP-4361224-B1 METHOD FOR PRODUCING A PRINTED MATTER TORAY INDUSTRIES (JP) 2025-12-10 EP disclosed
EP-4282662-B1 ACTIVE ENERGY RAY-CURABLE PLANOGRAPHIC PRINTING INK SET, METHOD FOR MANUFACTURING PRINTED MATTER, AND ACTIVE ENERGY RAY-CURABLE PLANOGRAPHIC PRINTING INK TORAY INDUSTRIES (JP) 2025-07-30 EP disclosed
CN-113552768-B Photosensitive coloring composition, color filter and image display device 爱天思株式会社 2025-06-17 CN disclosed
CN-120161673-A Curable composition, film using same, optical filter, solid-state imaging element, image display device, and infrared sensor 爱天思株式会社 2025-06-17 CN disclosed
EP-4549475-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION, ACTIVE ENERGY RAY-CURABLE INK, AND PRINTED OBJECT PRODUCTION METHOD Toray Industries, Inc. (JP) 2025-05-07 EP disclosed
CN-119781244-A Photosensitive composition for color filter, image display device, and solid-state imaging element 爱天思株式会社 2025-04-08 CN disclosed
WO-2025062940-A1 RESIN COMPOSITION, SUBSTRATE WITH PIEZOELECTRIC FILM, AND METHOD FOR PRODUCING SUBSTRATE WITH PIEZOELECTRIC FILM 東レ株式会社 2025-03-27 WO disclosed
CN-119575757-A Photosensitive coloring composition, color filter, liquid crystal display device, and solid-state imaging element 爱天思株式会社 2025-03-07 CN disclosed
CN-116745370-B Active energy ray-curable lithographic ink set, method for producing printed matter, and active energy ray-curable lithographic ink 东丽株式会社 2025-02-25 CN disclosed
US-20020008470-A1 Paste, display member, and process for production of display member TORAY INDUSTRIES INC. (JP) 2002-01-24 US disclosed
US-20020001763-A1 Photosensitive resin compositions, insulating films, and processes for formation of the films UBE INDUSTRIES, LTD. 2002-01-03 US disclosed
EP-1158019-A2 Paste, display member, and process for production of display member TORAY INDUSTRIES, INC. (JP) 2001-11-28 EP disclosed
US-6172295-B1 THE SOLAR CELL PANEL IS FIXED ONTO THE PROJECTING PLATE OF THE FRAME BY A MOISTURE CURING HOT-MELT ADHESIVE COMPOSED A POLYMER CONTAINING AT LEAST TWO HYDROLYTIC SILYL GROUP IN ONE MOLECULE; HIGH BONDING STRENGTH AND WEATHERPROOFING SUNSTER GIKEN KABUSHIKI KAISHA (JP) 2001-01-09 US disclosed
EP-0732348-B1 Moisture curable polymer composition and process for production thereof SUNSTAR ENGINEERING INC (JP) 2000-08-09 EP disclosed
US-6054503-A TRANSPARENCY; IMPACT STRENGTH; LOW SPECIFIC GRAVITY KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 2000-04-25 US disclosed
EP-0952167-A1 PLASTIC LENS MATERIAL AND PROCESS FOR PREPARING THE SAME KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1999-10-27 EP disclosed
US-5767197-A PARTICLES OF AN ACRYLIC POLYMER HAVING A SILYL GROUP AND INCLUDING AN ACRYLIC MONOMER HAVING TWO OR MORE (METH)ACRYLATE GROUPS DISPERSED IN A DIISOCYANATE-REACTIVE POLYMER HAVING SILYL GROUPS; COATINGS; ADHESIVES; SEALS SUNSTAR GIKEN KABUSHIKI KAISHA (JP) 1998-06-16 US disclosed
EP-0845816-A1 SOLAR CELL MODULE AND ITS MANUFACTURING METHOD SUNSTAR GIKEN KABUSHIKI KAISHA (JP) 1998-06-03 EP disclosed
EP-0732348-A1 Moisture curable polymer composition and process for production thereof SUNSTAR GIKEN KABUSHIKI KAISHA (JP) 1996-09-18 EP disclosed