SCHEMBL15733385

SCHEMBL15733385

CCO[Si](CCc1cc(F)c(F)c(F)c1)(OCC)OCC

nearest known ligand 0.31

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
MAOB P27338 1/20 0.31
RIPK1 Q13546 1/20 0.31
KDM4E B2RXH2 1/20 0.30
ALDH1A1 P00352 1/20 0.30
LMNA P02545 1/20 0.30
HPGD P15428 1/20 0.30
NOS3 P29474 1/20 0.30
NOS1 P29475 1/20 0.30
NOS2 P35228 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15738324 0.91
SCHEMBL15737738 0.91 MAOB (0.32) MAOB
SCHEMBL15736593 0.89 NOS3 (0.31) NOS3NOS1NOS2
SCHEMBL15736180 0.88 PTGS2 (0.31) NOS3NOS1NOS2
SCHEMBL15734773 0.86 PTGS2 (0.33)
SCHEMBL15736867 0.86 PTGS2 (0.33)
SCHEMBL15737080 0.86
SCHEMBL15733771 0.84 NOS3 (0.32) MAOBRIPK1NOS3NOS1NOS2
SCHEMBL15738955 0.84 MAOB (0.30) MAOBRIPK1
SCHEMBL15734312 0.83 IDO1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2927936-B1 METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE SHINETSU CHEMICAL CO (JP) 2021-06-02 EP disclosed
US-10727410-B2 Surface modifier for transparent oxide electrode, surface-modified transparent oxide electrode, and method for producing surface-modified transparent oxide electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-28 US disclosed
CN-109872830-A Production method for the surface modifier of metal electrode, surface-modified metal electrode and surface-modified metal electrode 信越化学工业株式会社 2019-06-11 CN disclosed
US-9947871-B2 Surface modifier for metal electrode, surface-modified metal electrode, and method for producing surface-modified metal electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-04-17 US disclosed
US-20150295176-A1 SURFACE MODIFIER FOR METAL ELECTRODE, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-15 US disclosed
EP-2927936-A1 SURFACE MODIFYING AGENT FOR METAL ELECTRODES, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE Shin-Etsu Chemical Co., Ltd. (JP) 2015-10-07 EP disclosed
CN-104823266-A Surface modifier for metal electrode, surface-modified metal electrode, and method for producing surface-modified metal electrode SHINETSU CHEMICAL CO 2015-08-05 CN disclosed
CN-103848859-A Surface modifier for transparent oxide electrode, surface-modified transparent oxide electrode, and method for producing same SHINETSU CHEMICAL CO 2014-06-11 CN disclosed
EP-2738230-A1 Surface modifier for transparent oxide electrode, surface-modified transparent oxide electrode, and method for producing surface-modified transparent oxide electrode Shin-Etsu Chemical Co., Ltd. (JP) 2014-06-04 EP disclosed
US-20140147628-A1 Surface Modifier For Transparent Oxide Electrode, Surface-Modified Transparent Oxide Electrode, And Method For Producing Surface-Modified Transparent Oxide Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-05-29 US disclosed