Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 2/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.41 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.41 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.41 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.41 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.41 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.41 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.41 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.41 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.41 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL157343 | 1.00 | CYP2C19 (0.47) | CYP2C19HIF1AMAPTKMT2AKCNN4 | |
| SCHEMBL11379208 | 0.81 | CYP2C19 (0.52) | CYP2C19HIF1AMAPTKMT2AKCNN4 | |
| SCHEMBL27570729 | 0.80 | CYP2C19 (0.47) | CYP2C19HIF1AMAPTKMT2AKCNN4 | |
| SCHEMBL42458 | 0.79 | ALDH1A1 (0.56) | CYP2C19HIF1AMAPTKMT2AKCNN4 | |
| SCHEMBL21400812 | 0.79 | CYP2C19 (0.32) | CYP2C19HIF1A | |
| SCHEMBL9876860 | 0.78 | CES1 (0.48) | CYP2C19HIF1AMAPTKMT2AKCNN4 | |
| SCHEMBL8324538 | 0.78 | CYP2C19 (0.48) | CYP2C19HIF1AMAPTKMT2AKCNN4 | |
| SCHEMBL21400815 | 0.77 | CYP2C19 (0.31) | CYP2C19HIF1A | |
| SCHEMBL5666953 | 0.77 | KCNN4 (0.47) | CYP2C19HIF1AMAPTKMT2AKCNN4 | |
| SCHEMBL1096837 | 0.77 | KCNN4 (0.47) | CYP2C19HIF1AMAPTKMT2AKCNN4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 883 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4469517-A2 | HYDROPHOBIC POLYMER COMPOSITIONS AND A METHOD TO PREPARE HYDROPHOBIC POLYMER COMPOSITIONS | Mitsubishi Chemical America, Inc. (US) | 2024-12-04 | — | — | EP | claimed |
| US-20240101731-A1 | HYDROPHOBIC POLYMER COMPOSITIONS AND A METHOD TO PREPARE HYDROPHOBIC POLYMER COMPOSITIONS | MITSUBISHI CHEMICAL AMERICA, INC. (US) | 2024-03-28 | — | — | US | claimed |
| WO-2023146872-A2 | HYDROPHOBIC POLYMER COMPOSITIONS AND A METHOD TO PREPARE HYDROPHOBIC POLYMER COMPOSITIONS | MITSUBISHI CHEMICAL AMERICA, INC. (US) | 2023-08-03 | — | — | WO | claimed |
| US-11339251-B2 | Resin composition, resin film, laminate, multilayer printed wiring board and method for producing multilayer printed wiring board | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2022-05-24 | — | — | US | claimed |
| EP-3252110-B1 | ULTRAVIOLET CURABLE RESIN COMPOSITION AND SLIDING MEMBER | MINEBEA MITSUMI INC (JP) | 2019-04-24 | — | — | EP | claimed |
| US-10167439-B2 | Ultraviolet curable resin composition and sliding member | MINEBEA MITSUMI INC. (JP) | 2019-01-01 | — | — | US | claimed |
| US-20170349851-A1 | ULTRAVIOLET CURABLE RESIN COMPOSITION AND SLIDING MEMBER | MINEBEA MITSUMI INC. (JP) | 2017-12-07 | — | — | US | claimed |
| EP-3252110-A1 | ULTRAVIOLET CURABLE RESIN COMPOSITION AND SLIDING MEMBER | Minebea Mitsumi Inc. (JP) | 2017-12-06 | — | — | EP | claimed |
| US-9334400-B2 | Highly branched lipophilic polymer, and photopolymerizable composition containing the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-05-10 | — | — | US | claimed |
| JP-10298535-A | — | — | None | — | — | JP | disclosed |
| JP-10298534-A | — | — | None | — | — | JP | disclosed |
| JP-8134250-A | — | — | None | — | — | JP | disclosed |
| US-20260147274-A1 | SULFONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-28 | — | — | US | disclosed |
| US-20260139086-A1 | ONIUM SALT TYPE MONOMER, MONOMERIC PHOTO-ACID GENERATOR, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-21 | — | — | US | disclosed |
| JP-H10298534-A | FOAMING AGENT COMPOSITION CONTAINING AZOALKANE DERIVATIVE AND FOAMED MATERIAL | OTSUKA CHEM CO LTD | 1998-11-10 | — | — | JP | disclosed |
| JP-H10298535-A | FOAMING AGENT COMPOSITION CONTAINING AZOALKANE DERIVATIVE AND FOAMED MATERIAL | OTSUKA CHEM CO LTD | 1998-11-10 | — | — | JP | disclosed |
| EP-0861861-A1 | Polymer polyol, and flame retardant polyurethane resin and foam prepared therefrom | Mitsui Chemicals, Inc. (JP) | 1998-09-02 | — | — | EP | disclosed |
| US-5728793-A | Process for production of methacrylate polymers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-03-17 | — | — | US | disclosed |
| JP-H08134250-A | SILICONE RUBBER SPONGE COMPOSITION AND SILICONE RUBBER SPONGE PRODUCED THEREFROM | TOSHIBA SILICONE CO LTD | 1996-05-28 | — | — | JP | disclosed |
| US-4988787-A | Addition copolymers from unsaturated isocyanates and acrylonitrile, maleic anhydride, maleimide or acrylic esters | BAYER AKTIENGESELLSCHAFT (DE) | 1991-01-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260147274-A1 | SULFONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | RSU1, ETV6, NAF1 | CYP2C19 4356/4885HIF1A 1947/4885MAPT 3466/4885 |
| US-20260139086-A1 | ONIUM SALT TYPE MONOMER, MONOMERIC PHOTO-ACID GENERATOR, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | CLTA, ARCN1, CLTB | CYP2C19 4277/4885HIF1A 1783/4885MAPT 2134/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.