SCHEMBL15735652

SCHEMBL15735652

CO[Si](CCCCCc1ccc(F)cc1)(OC)OC

nearest known ligand 0.44

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 3/20 0.40
FPR2 P25090 1/20 0.38
CYP19A1 P11511 1/20 0.38
AOC3 Q16853 1/20 0.38
KDM4E B2RXH2 1/20 0.38
MEN1 O00255 1/20 0.38
POLB P06746 1/20 0.38
MAPT P10636 1/20 0.38
MAPK1 P28482 1/20 0.38
KMT2A Q03164 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
GAA P10253 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15736181 1.00 TAAR1 (0.40) TAAR1FPR2CYP19A1AOC3KDM4E
SCHEMBL15735870 0.98 TAAR1 (0.41) TAAR1FPR2CYP19A1AOC3KDM4E
SCHEMBL15734562 0.93 TAAR1 (0.42) TAAR1FPR2CYP19A1AOC3KDM4E
SCHEMBL15737837 0.89 ALDH1A1 (0.35) TAAR1CYP19A1KDM4EMAPTKMT2A
SCHEMBL15738900 0.89 ALDH1A1 (0.35) TAAR1CYP19A1KDM4EMAPTKMT2A
SCHEMBL15737957 0.89 ALDH1A1 (0.35) TAAR1CYP19A1KDM4EMAPTKMT2A
SCHEMBL15736942 0.89 ALDH1A1 (0.35) TAAR1CYP19A1KDM4EMAPTKMT2A
SCHEMBL25242964 0.89 CALM1 (0.44) TAAR1KDM4EL3MBTL1
SCHEMBL12589204 0.88 MAOB (0.46) TAAR1FPR2CYP19A1AOC3KDM4E
SCHEMBL15737365 0.88 KMT2A (0.36) TAAR1CYP19A1KDM4EMEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2927936-B1 METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE SHINETSU CHEMICAL CO (JP) 2021-06-02 EP disclosed
US-10727410-B2 Surface modifier for transparent oxide electrode, surface-modified transparent oxide electrode, and method for producing surface-modified transparent oxide electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-28 US disclosed
US-9947871-B2 Surface modifier for metal electrode, surface-modified metal electrode, and method for producing surface-modified metal electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-04-17 US disclosed
CN-107141313-A Transparent oxide electrode and its production method that surface modifier, surface for transparent oxide electrode are modified 信越化学工业株式会社 2017-09-08 CN disclosed
US-20150295176-A1 SURFACE MODIFIER FOR METAL ELECTRODE, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-15 US disclosed
EP-2927936-A1 SURFACE MODIFYING AGENT FOR METAL ELECTRODES, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE Shin-Etsu Chemical Co., Ltd. (JP) 2015-10-07 EP disclosed
CN-104823266-A Surface modifier for metal electrode, surface-modified metal electrode, and method for producing surface-modified metal electrode SHINETSU CHEMICAL CO 2015-08-05 CN disclosed
CN-103848859-A Surface modifier for transparent oxide electrode, surface-modified transparent oxide electrode, and method for producing same SHINETSU CHEMICAL CO 2014-06-11 CN disclosed
US-20140147628-A1 Surface Modifier For Transparent Oxide Electrode, Surface-Modified Transparent Oxide Electrode, And Method For Producing Surface-Modified Transparent Oxide Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-05-29 US disclosed