SCHEMBL1576797

SCHEMBL1576797

C=C(C)COCCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10031351 0.95 MEN1 (0.40)
SCHEMBL1576747 0.93 CES2 (0.39)
SCHEMBL8533909 0.91 MEN1 (0.40)
SCHEMBL8537833 0.91 MEN1 (0.40)
SCHEMBL2793665 0.91 CES2 (0.42)
SCHEMBL2790873 0.91 CES2 (0.42)
SCHEMBL871697 0.87 CES2 (0.44)
SCHEMBL7256155 0.87 CES2 (0.39)
1,4-Butanediol SCHEMBL871698 0.84 SMN1; SMN2 (0.36)
SCHEMBL1326296 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100510183-C Aqueous surface treatment agent for plated metal sheet, surface-treated metal sheet, and method for producing same NIPPON STEEL CORP NIHON PARKER (JP) 2009-07-08 CN claimed
WO-2025121222-A1 INORGANIC FINE PARTICLE DISPERSION ナガセケムテックス株式会社 2025-06-12 WO disclosed
CN-109923087-A Cement composition additive and cement composition 日本制纸株式会社 2019-06-21 CN disclosed
US-8735534-B2 Precursor composition for polyimide and use thereof ETERNAL CHEMICAL CO., LTD. (TW) 2014-05-27 US disclosed
US-20130090432-A1 ALKOXYLATED POLYMERS BASF SE (DE) 2013-04-11 US disclosed
EP-2483320-A1 ALKOXYLATED POLYMERS BASF SE (DE) 2012-08-08 EP disclosed
CN-102549033-A Alkoxylated polymers BASF SE 2012-07-04 CN disclosed
WO-2011039200-A1 ALKOXYLATED POLYMERS BASF SE (DE) 2011-04-07 WO disclosed
US-20100168265-A1 PRECURSOR COMPOSITION FOR POLYIMIDE AND USE THEREOF ETERNAL CHEMICAL CO., LTD. (TW) 2010-07-01 US disclosed
US-7548298-B2 Liquid crystal panel, method for producing liquid crystal panel, and electronic apparatus SEIKO EPSON CORPORATION (JP) 2009-06-16 US disclosed
US-20070085954-A1 LIQUID CRYSTAL PANEL, METHOD FOR PRODUCING LIQUID CRYSTAL PANEL, AND ELECTRONIC APPARATUS SEIKO EPSON CORPORATION (JP) 2007-04-19 US disclosed
EP-0679950-B1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 2000-07-26 EP disclosed
EP-0953601-A1 AQUEOUS EMULSION CONTAINING FINE PARTICLES OF CROSS-LINKED ALLYLIC COPOLYMER DAISO CO., LTD. (JP) 1999-11-03 EP disclosed
EP-0679950-A2 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1995-11-02 EP disclosed
US-5109097-A Polyethylenically-unsaturated polyurethane, polyurea and poythiourethane polymers; solvent, wear resistant coatings MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-04-28 US disclosed
EP-0327258-A2 Radiation-curable protective coating composition MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1989-08-09 EP disclosed
US-4855184-A Radiation-curable protective coating composition MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1989-08-08 US disclosed