SCHEMBL1578091

SCHEMBL1578091

F[B-](F)(F)F.N#[N+]c1cc(F)c(F)c(F)c1

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.32
CES1 P23141 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31727021 0.72 ACHE (0.38)
SCHEMBL829628 0.70 TSHR (0.40)
SCHEMBL28239203 0.70
SCHEMBL28097946 0.70 ALDH1A1 (0.33)
SCHEMBL5380526 0.69
SCHEMBL5370217 0.69
SCHEMBL391383 0.69
SCHEMBL5478604 0.68 ALDH1A1 (0.38)
SCHEMBL10617374 0.67
SCHEMBL9847915 0.67 MEN1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8735284-B2 Conductive metal and diffusion barrier seed compositions, and methods of use in semiconductor and interlevel dielectric substrates INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-27 US disclosed
US-20140072796-A1 CONDUCTIVE METAL AND DIFFUSION BARRIER SEED COMPOSITIONS, AND METHODS OF USE IN SEMICONDUCTOR AND INTERLEVEL DIELECTRIC SUBSTRATES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-03-13 US disclosed
US-8647535-B2 Conductive metal and diffusion barrier seed compositions, and methods of use in semiconductor and interlevel dielectric substrates INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-02-11 US disclosed
US-8637707-B2 Method for producing aminobiphenylene BASF SE (DE) 2014-01-28 US disclosed
US-20120178241-A1 CONDUCTIVE METAL AND DIFFUSION BARRIER SEED COMPOSITIONS, AND METHODS OF USE IN SEMICONDUCTOR AND INTERLEVEL DIELECTRIC SUBSTRATES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-07-12 US disclosed
EP-2310353-A1 METHOD FOR PRODUCING AMINOBIPHENYLENE BASF SE (DE) 2011-04-20 EP disclosed
WO-2010000856-A1 METHOD FOR PRODUCING AMINOBIPHENYLENE BASF SE (DE) 2010-01-07 WO disclosed