⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2757577 | 1.00 | — | — | |
| SCHEMBL10634092 | 0.96 | — | — | |
| Fluoride SCHEMBL752724 | 0.96 | ACHE (0.57) | — | |
| Phosphine SCHEMBL11574538 | 0.96 | — | — | |
| Fluoride SCHEMBL752726 | 0.96 | ACHE (0.57) | — | |
| SCHEMBL17078009 | 0.96 | — | — | |
| Hydrochloric Acid SCHEMBL17559514 | 0.96 | — | — | |
| Ammonia Solution, Strong SCHEMBL11574766 | 0.96 | — | — | |
| Bromide SCHEMBL3346674 | 0.96 | — | — | |
| Fluoride SCHEMBL4233421 | 0.96 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 5707 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122071430-A | Crystal form, preparation method and application of N- (4-methylphenyl) -2-pyridone compound | 大连理工大学 | 2026-05-22 | — | — | CN | claimed |
| CN-121574107-A | Method for synthesizing aryl thiobenzothiazole compound based on cuprous chloride | 苏州大学 | 2026-02-27 | — | — | CN | claimed |
| CN-121575421-A | Method for realizing iodobenzene-mediated olefin double-azide reaction by two-phase electrochemical reaction system | 郑州大学第一附属医院 | 2026-02-27 | — | — | CN | claimed |
| EP-4684045-A1 | AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES | Versum Materials US, LLC (US) | 2026-01-28 | — | — | EP | claimed |
| CN-117362311-B | Foscoline tetracyclic analogue and preparation method thereof | 南通大学 | 2025-04-04 | — | — | CN | claimed |
| CN-119684185-A | Method for preparing sulfonium salt by using functional ionic liquid | 大连天源基化学有限公司 | 2025-03-25 | — | — | CN | claimed |
| CN-116375616-B | Preparation method of diphenyl sulfide compound | 沈阳化工大学 | 2025-03-07 | — | — | CN | claimed |
| CN-119570032-A | Synthesis method of polyarylene sulfide polymer | 南京大学 | 2025-03-07 | — | — | CN | claimed |
| CN-119552051-A | Preparation method of cationic photoinitiator 4-isobutylphenyl-4' -methylphenyl iodonium hexafluorophosphate | 中国船舶集团有限公司第七一八研究所 | 2025-03-04 | — | — | CN | claimed |
| WO-2025030778-A1 | STAR-LIKE MICROMOLECULAR CROSS-LINKED HOLE TRANSPORT MATERIAL, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 天津大学 | 2025-02-13 | — | — | WO | claimed |
| CN-1014607-B | Process for preparing copoly arylene sulfide | EASTMAN KODAK CO (US) | 1991-11-06 | — | — | CN | claimed |
| EP-0455423-A2 | Ortho-lithiation process for the synthesis of 2-substituted 1-(tetrazol-5-yl) benzenes | MERCK & CO. INC. (US) | 1991-11-06 | — | — | EP | claimed |
| US-5039814-A | Chemical intermediates for angiotensin antagonist | MERCK & CO., INC. (US) | 1991-08-13 | — | — | US | claimed |
| US-4968581-A | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-11-06 | — | — | US | claimed |
| US-4939309-A | REACTING ARYL HALIDE WITH NICKEL-ORGANOPHOSPHINE-ORGANOMETAL-LIC-BIDENTATE LIGAND CATALYST | EASTMAN KODAK COMPANY (US) | 1990-07-03 | — | — | US | claimed |
| US-4912018-A | High resolution photoresist based on imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| CN-1032663-A | The preparation method of copoly (Arylene Sulfide) | EASTMAN KODAK CO (US) | 1989-05-03 | — | — | CN | claimed |
| US-4810613-A | Blocked monomer and polymers therefrom for use as photoresists | HOECHST CELANESE CORPORATION (US) | 1989-03-07 | — | — | US | claimed |
| EP-0070198-B1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMATION METHOD USING THE SAME | Hitachi, Ltd. (JP) | 1985-06-19 | — | — | EP | claimed |
| EP-0070198-A1 | Radiation-sensitive composition and pattern-formation method using the same | Hitachi, Ltd. (JP) | 1983-01-19 | — | — | EP | claimed |