⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22201020 | 0.74 | — | — | |
| SCHEMBL19850946 | 0.74 | — | — | |
| SCHEMBL3755755 | 0.73 | — | — | |
| SCHEMBL25701214 | 0.73 | — | — | |
| SCHEMBL25701233 | 0.73 | — | — | |
| SCHEMBL25701227 | 0.71 | — | — | |
| SCHEMBL13034846 | 0.70 | — | — | |
| SCHEMBL25701220 | 0.69 | — | — | |
| SCHEMBL13034848 | 0.68 | — | — | |
| SCHEMBL22201021 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230205084-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20230205084-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-9040224-B2 | Resist composition, method of forming resist pattern and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-26 | — | — | US | disclosed |
| US-20140178821-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |