SCHEMBL22201021

SCHEMBL22201021

C[C@@H]1C2CC3(C#N)C(=O)OC1C3O2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17853715 0.73 UBE2D3 (0.31) —
SCHEMBL25701242 0.73 UBE2D3 (0.31) —
SCHEMBL12204602 0.73 HMGCR (0.32) —
SCHEMBL1219045 0.73 KDM4E (0.30) —
SCHEMBL17166005 0.73 KDM4E (0.30) —
SCHEMBL25701255 0.72 — —
SCHEMBL14617250 0.70 — —
SCHEMBL25701220 0.70 — —
SCHEMBL16591125 0.69 HMGCR (0.30) —
SCHEMBL17150978 0.69 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200218154-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-09 — — US disclosed
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