⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21432112 | 0.81 | KDM4E (0.30) | — | |
| SCHEMBL19996962 | 0.81 | KDM4E (0.30) | — | |
| SCHEMBL685664 | 0.81 | KDM4E (0.30) | — | |
| SCHEMBL3749984 | 0.80 | KMT2A (0.31) | — | |
| SCHEMBL3745571 | 0.80 | KDM4E (0.31) | — | |
| SCHEMBL1219045 | 0.76 | KDM4E (0.30) | — | |
| SCHEMBL17166005 | 0.76 | KDM4E (0.30) | — | |
| SCHEMBL21010616 | 0.75 | KDM4E (0.31) | — | |
| SCHEMBL23641342 | 0.75 | — | — | |
| SCHEMBL19432712 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8637623-B2 | Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2014-01-28 | — | — | US | disclosed |
| US-20100316954-A1 | MONOMER HAVING LACTONE SKELETON, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100297555-A1 | MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-25 | — | — | US | disclosed |