SCHEMBL15840335

SCHEMBL15840335

C=C(C)C(=O)OC(CCC)CC(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.34
TSHR P16473 3/20 0.33
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19335246 0.91 ALDH1A1 (0.32) ALDH1A1TSHR
SCHEMBL17297212 0.88 ALDH1A1 (0.34) ALDH1A1TSHRTHRB
SCHEMBL15840337 0.87 TSHR (0.34) ALDH1A1TSHRTHRB
SCHEMBL15962399 0.86 ALDH1A1 (0.33) ALDH1A1TSHRTHRB
SCHEMBL15836497 0.86 ALDH1A1 (0.33) ALDH1A1TSHRTHRB
SCHEMBL19335248 0.81 TSHR (0.36) TSHR
SCHEMBL11863394 0.81 ALDH1A1 (0.46) ALDH1A1TSHRTHRB
SCHEMBL15836505 0.81 ALDH1A1 (0.36) ALDH1A1TSHRTHRB
SCHEMBL440084 0.78 ALDH1A1 (0.43) ALDH1A1TSHRTHRB
SCHEMBL25962737 0.78 TSHR (0.37) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed
US-20160363866-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-15 US disclosed
US-9201300-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-01 US disclosed
US-20140178818-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed