SCHEMBL15840341

SCHEMBL15840341

C=C(C)C(=O)Oc1ccc(C(O)(C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.50
SMN1; SMN2 Q16637 2/20 0.49
KMT2A Q03164 2/20 0.47
ATM Q13315 1/20 0.47
MLYCD O95822 5/20 0.44
NR1H3 Q13133 7/20 0.43
NR1H2 P55055 6/20 0.43
LMNA P02545 2/20 0.41
HTT P42858 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15836489 0.86 HSD11B1 (0.49) ELANEKMT2AATMNR1H3
SCHEMBL373661 0.85 ELANE (0.51) ELANESMN1; SMN2KMT2AATMLMNA
SCHEMBL14536591 0.85 ELANE (0.54) ELANEKMT2AATM
SCHEMBL2266773 0.84 ELANE (0.40) ELANESMN1; SMN2KMT2AATMMLYCD
SCHEMBL26362756 0.84 ELANE (0.50) ELANESMN1; SMN2KMT2AATMLMNA
SCHEMBL25873039 0.84 ELANE (0.50) ELANESMN1; SMN2KMT2AATMLMNA
SCHEMBL28638977 0.83 ELANE (0.49) ELANESMN1; SMN2KMT2AATMLMNA
SCHEMBL20414525 0.83 ELANE (0.49) ELANESMN1; SMN2KMT2AATMLMNA
SCHEMBL15836493 0.82 ELANE (0.42) ELANESMN1; SMN2KMT2AATMMLYCD
SCHEMBL12213360 0.81 ELANE (0.50) ELANEKMT2AATMLMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11786160-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-17 US disclosed
US-11681224-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-20 US disclosed
US-20230159766-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-11357970-B2 Biomedical electrode composition, biomedical electrode and method for manufacturing the biomedical electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-14 US disclosed
US-20210380738-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-12-09 US disclosed
US-11071485-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-07-27 US disclosed
US-20200247926-A1 POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-06 US disclosed
US-10726967-B2 Polymerizable monomer, polymer compound, biological electrode composition, biological electrode, and method for producing biological electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-28 US disclosed
US-20200064735-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-02-27 US disclosed
US-20190254548-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-08-22 US disclosed
US-20170058059-A1 POLYMER COMPOUND FOR A CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-02 US disclosed
US-20170037178-A1 BLOCK COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD OF FORMING AN ELECTRONIC DEVICE THE UNIVERSITY OF QUEENSLAND (AU) 2017-02-09 US disclosed
US-20170037178-A1 BLOCK COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD OF FORMING AN ELECTRONIC DEVICE THE UNIVERSITY OF QUEENSLAND (AU) 2017-02-09 US disclosed
US-20170037171-A1 COPOLYMER AND ASSOCIATED LAYERED ARTICLE, AND DEVICE-FORMING METHOD THE UNIVERSITY OF QUEENSLAND (AU) 2017-02-09 US disclosed
US-20170037171-A1 COPOLYMER AND ASSOCIATED LAYERED ARTICLE, AND DEVICE-FORMING METHOD THE UNIVERSITY OF QUEENSLAND (AU) 2017-02-09 US disclosed
US-9459533-B2 Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist DOW GLOBAL TECHNOLOGIES LLC (US) 2016-10-04 US disclosed
US-9201300-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-01 US disclosed
US-9182669-B2 Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-11-10 US disclosed
US-20150177614-A1 COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-06-25 US disclosed
US-20140178818-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200247926-A1 POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND HCN4, HCN2, HCN3 ELANE 3007/4885SMN1; SMN2 2771/4885KMT2A 971/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.