⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16332747 | 0.69 | — | — | |
| SCHEMBL16405951 | 0.67 | — | — | |
| SCHEMBL17041925 | 0.67 | — | — | |
| SCHEMBL16405962 | 0.67 | — | — | |
| SCHEMBL17295684 | 0.65 | — | — | |
| SCHEMBL17041920 | 0.65 | — | — | |
| SCHEMBL17041921 | 0.64 | — | — | |
| SCHEMBL19973247 | 0.62 | — | — | |
| SCHEMBL18817942 | 0.62 | — | — | |
| SCHEMBL16582936 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3347504-B1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS | VERSUM MAT US LLC (US) | 2024-09-25 | — | — | EP | claimed |
| CN-117942985-A | Methane catalytic combustion catalyst with strong sulfur resistance, and preparation method and application thereof | 中国科学院赣江创新研究院 | 2024-04-30 | — | — | CN | claimed |
| CN-117265512-A | Method for depositing conformal metal or metalloid silicon nitride films and resulting films | 弗萨姆材料美国有限责任公司 | 2023-12-22 | — | — | CN | claimed |
| CN-116782865-A | Atomic layer deposition coated pharmaceutical packages, improved syringes and vials, e.g., for lyophilization/cold chain drugs/vaccines | SIO2医药产品公司 | 2023-09-19 | — | — | CN | claimed |
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| CN-115053016-A | Precursors for high temperature deposition of silicon-containing films | 朗姆研究公司 | 2022-09-13 | — | — | CN | claimed |
| US-10858378-B2 | Synthesis of disilanylamines through transamination | DOW SILICONES CORPORATION (US) | 2020-12-08 | — | — | US | claimed |
| EP-2944608-B1 | ORGANOAMINODISILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPRISING SAME | VERSUM MAT US LLC (US) | 2020-04-22 | — | — | EP | claimed |
| EP-3395822-B1 | ORGANOAMINOSILANES AND METHODS FOR MAKING SAME | VERSUM MAT US LLC (US) | 2020-03-25 | — | — | EP | claimed |
| EP-3395822-A1 | ORGANOAMINOSILANES AND METHODS FOR MAKING SAME | Versum Materials US, LLC (US) | 2018-10-31 | — | — | EP | claimed |
| US-9627193-B2 | Organoaminodisilane precursors and methods for depositing films comprising same | VERSUM MATERIALS US, LLC (US) | 2017-04-18 | — | — | US | claimed |
| EP-2669248-B1 | Organoaminodisilane precursors and methods for depositing films comprising same | AIR PROD & CHEM (US) | 2017-04-12 | — | — | EP | claimed |
| EP-3149011-A1 | PROCESS OF SYNTHESIZING DIISOPROPYLAMINW-DISILANES | Dow Corning Corporation (US) | 2017-04-05 | — | — | EP | claimed |
| US-20170029446-A1 | Process Of Synthesizing Diisopropylamino-Disilanes | DOW CORNING CORPORATION (US) | 2017-02-02 | — | — | US | claimed |
| US-20160168169-A1 | ORGANOAMINOSILANES AND METHODS FOR MAKING SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-06-16 | — | — | US | claimed |
| US-9293323-B2 | Method of forming silicon film | TOKYO ELECTRON LIMITED (JP) | 2016-03-22 | — | — | US | claimed |
| WO-2015184214-A1 | PROCESS OF SYNTHESIZING DIISOPROPYLAMINW-DISILANES | DOW CORNING CORPORATION (US) | 2015-12-03 | — | — | WO | claimed |
| US-20150246937-A1 | ORGANOAMINOSILANES AND METHODS FOR MAKING SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-09-03 | — | — | US | claimed |
| EP-2913334-A1 | Organoaminosilanes and methods for making same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-09-02 | — | — | EP | claimed |
| US-20140187025-A1 | METHOD OF FORMING SILICON FILM AND FILM FORMING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2014-07-03 | — | — | US | claimed |