⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2162666 | 0.77 | — | — | |
| SCHEMBL3435783 | 0.77 | — | — | |
| SCHEMBL3119944 | 0.74 | TSHR (0.30) | — | |
| SCHEMBL15170598 | 0.74 | ALDH1A1 (0.32) | — | |
| SCHEMBL3478236 | 0.74 | ALDH1A1 (0.32) | — | |
| SCHEMBL2808257 | 0.72 | ALDH1A1 (0.30) | — | |
| SCHEMBL2808254 | 0.72 | ALDH1A1 (0.30) | — | |
| SCHEMBL250680 | 0.67 | — | — | |
| SCHEMBL3803862 | 0.67 | — | — | |
| SCHEMBL7645091 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2491579-B1 | SELF-ALIGNED BARRIER AND CAPPING LAYERS FOR INTERCONNECTS | HARVARD COLLEGE (US) | 2019-03-13 | — | — | EP | claimed |
| US-8569165-B2 | Self-aligned barrier and capping layers for interconnects | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2013-10-29 | — | — | US | claimed |
| EP-2491579-A1 | SELF-ALIGNED BARRIER AND CAPPING LAYERS FOR INTERCONNECTS | President and Fellows of Harvard College (US) | 2012-08-29 | — | — | EP | claimed |
| US-20110163062-A1 | SELF-ALIGNED BARRIER AND CAPPING LAYERS FOR INTERCONNECTS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2011-07-07 | — | — | US | claimed |
| WO-2011050073-A1 | SELF-ALIGNED BARRIER AND CAPPING LAYERS FOR INTERCONNECTS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2011-04-28 | — | — | WO | claimed |
| CN-114334605-A | Method for manufacturing semiconductor device, method for processing substrate, substrate processing apparatus, and storage medium | 株式会社国际电气 | 2022-04-12 | — | — | CN | disclosed |
| EP-2491579-B1 | SELF-ALIGNED BARRIER AND CAPPING LAYERS FOR INTERCONNECTS | HARVARD COLLEGE (US) | 2019-03-13 | — | — | EP | disclosed |
| US-20170012001-A1 | SELF-ALIGNED BARRIER AND CAPPING LAYERS FOR INTERCONNECTS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2017-01-12 | — | — | US | disclosed |
| US-9390971-B2 | Self-aligned barrier and capping layers for interconnects | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2016-07-12 | — | — | US | disclosed |
| US-20150325474-A1 | Self-Aligned Barrier and Capping Layers For Interconnects | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2015-11-12 | — | — | US | disclosed |
| US-9112005-B2 | Self-aligned barrier and capping layers for interconnects | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2015-08-18 | — | — | US | disclosed |
| US-20140045331-A1 | SELF-ALIGNED BARRIER AND CAPPING LAYERS FOR INTERCONNECTS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2014-02-13 | — | — | US | disclosed |
| US-8569165-B2 | Self-aligned barrier and capping layers for interconnects | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2013-10-29 | — | — | US | disclosed |
| US-20110163062-A1 | SELF-ALIGNED BARRIER AND CAPPING LAYERS FOR INTERCONNECTS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2011-07-07 | — | — | US | disclosed |
| US-5512422-A | Method of forming resist pattern and organic silane compound for forming anti-reflection film for use in such method | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1996-04-30 | — | — | US | disclosed |
| US-5380889-A | Method of forming resist pattern and organic silane compound for forming anti-relflection film for use in such method | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1995-01-10 | — | — | US | disclosed |
| EP-0509271-A2 | Siloxi-Polytetrahydrofuran | BASF Aktiengesellschaft (DE) | 1992-10-21 | — | — | EP | disclosed |