SCHEMBL3478236

SCHEMBL3478236

C=CCN(CC=C)[Si](N(CC=C)CC=C)(N(CC=C)CC=C)N(CC=C)CC=C

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32
KDM4E B2RXH2 1/20 0.30
POLB P06746 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15170598 0.85 ALDH1A1 (0.32) ALDH1A1KDM4EPOLBTDP1
SCHEMBL716802 0.76
SCHEMBL3803865 0.76 ALDH1A1 (0.32) ALDH1A1
SCHEMBL7645091 0.76
SCHEMBL9110099 0.76 KDM4E (0.31) KDM4EPOLBTDP1
SCHEMBL3041595 0.76
SCHEMBL3435783 0.74
SCHEMBL2162666 0.74
SCHEMBL1585783 0.74
SCHEMBL8773255 0.72 TSHR (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10147600-B2 Methods for forming doped silicon oxide thin films ASM INTERNATIONAL N.V. (NL) 2018-12-04 US claimed
US-20180211834-A1 METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS ASM INTERNATIONAL N.V. (NL) 2018-07-26 US claimed
WO-2007030673-A2 VAPOR DEPOSITION OF HAFNIUM SILICATE MATERIALS WITH TRIS(DIMETHYLAMIDO)SILANE APPLIED MATERIALS, INC. (US) 2007-03-15 WO claimed
US-20060062917-A1 Vapor deposition of hafnium silicate materials with tris(dimethylamino)silane APPLIED MATERIALS, INC. 2006-03-23 US claimed
US-5209979-A Silicon carbide coated article with ceramic topcoat ETHYL CORPORATION (US) 1993-05-11 US claimed
US-5208284-A Coating composition ETHYL CORPORATION (US) 1993-05-04 US claimed
US-5173367-A Ceramic composites ETHYL CORPORATION (US) 1992-12-22 US claimed
US-4346468-A LUBRICATED WITH METHYLALKYL SILOXANE CONTAINING TETRAKIS(DIALKYLAMINO)SILANE RCA CORPORATION (US) 1982-08-24 US claimed
US-20230031720-A1 METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS ASM INTERNATIONAL N.V. (NL) 2023-02-02 US disclosed
US-11075083-B2 Si-passivated GE gate stack IMEC VZW (BE) 2021-07-27 US disclosed
US-20210025059-A1 PLASMA ATOMIC LAYER DEPOSITION ASM IP HOLDING B.V. (NL) 2021-01-28 US disclosed
US-20200388487-A1 METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS ASM INTERNATIONAL N.V. (NL) 2020-12-10 US disclosed
US-10822700-B2 Plasma atomic layer deposition ASM IP HOLDING B.V. (NL) 2020-11-03 US disclosed
US-10784105-B2 Methods for forming doped silicon oxide thin films ASM INTERNATIONAL N.V. (NL) 2020-09-22 US disclosed
US-5208284-A Coating composition ETHYL CORPORATION (US) 1993-05-04 US disclosed
US-5208284-A Coating composition ETHYL CORPORATION (US) 1993-05-04 US disclosed
US-5173367-A Ceramic composites ETHYL CORPORATION (US) 1992-12-22 US disclosed
US-4346468-A LUBRICATED WITH METHYLALKYL SILOXANE CONTAINING TETRAKIS(DIALKYLAMINO)SILANE RCA CORPORATION (US) 1982-08-24 US disclosed
US-4346468-A LUBRICATED WITH METHYLALKYL SILOXANE CONTAINING TETRAKIS(DIALKYLAMINO)SILANE RCA CORPORATION (US) 1982-08-24 US disclosed
US-4167423-A CALCIUM CARBONATE, METAL SILICATE, ORGANOSILANE COUPLER UNION CARBIDE CORPORATION (US) 1979-09-11 US disclosed