SCHEMBL15869168

SCHEMBL15869168

c1cc(C2CCC(c3ccc(OC4CCCCO4)cc3)(c3ccc(OC4CCCCO4)cc3)CC2)ccc1OC1CCCCO1

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ TNK2 Q07912 3/20 0.37
▸ HSD11B1 P28845 1/20 0.36
▸ DHFR P00374 1/20 0.35
▸ MEN1 O00255 2/20 0.33
▸ KMT2A Q03164 2/20 0.33
▸ ALDH1A1 P00352 1/20 0.31
▸ CYP3A4 P08684 1/20 0.31
▸ CYP2C9 P11712 1/20 0.31
▸ CYP2C19 P33261 1/20 0.31
▸ ACP1 P24666 1/20 0.31
▸ KCNH2 Q12809 1/20 0.31
▸ HRH3 Q9Y5N1 1/20 0.31
▸ KDM4C Q9H3R0 1/20 0.30
▸ ADORA3 P0DMS8 1/20 0.30
▸ NPC1 O15118 1/20 0.30
▸ RAB9A P51151 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16554082 0.85 TNK2 (0.42) TNK2HSD11B1DHFRMEN1KMT2A
SCHEMBL26154145 0.85 TNK2 (0.45) TNK2HSD11B1DHFRMEN1KMT2A
SCHEMBL15869206 0.83 HSD11B1 (0.38) TNK2HSD11B1DHFRMEN1KMT2A
SCHEMBL3500438 0.79 TNK2 (0.44) TNK2HSD11B1DHFRMEN1KMT2A
SCHEMBL7144983 0.78 TNK2 (0.38) TNK2HSD11B1DHFRMEN1KMT2A
SCHEMBL11717269 0.75 TNK2 (0.40) TNK2HSD11B1MEN1KMT2AALDH1A1
SCHEMBL33523796 0.75 KCNH2 (0.41) TNK2HSD11B1DHFRMEN1KMT2A
SCHEMBL1516026 0.75 HSD11B1 (0.42) TNK2HSD11B1DHFRMEN1KMT2A
SCHEMBL15093765 0.71 MEN1 (0.43) TNK2HSD11B1DHFRMEN1KMT2A
SCHEMBL674989 0.71 TNK2 (0.40) TNK2HSD11B1DHFRMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
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