SCHEMBL15869206

SCHEMBL15869206

CC(C)(C1CCC(c2ccc(OC3CCCCO3)cc2)(c2ccc(OC3CCCCO3)cc2)CC1)C1CCC(c2ccc(OC3CCCCO3)cc2)(c2ccc(OC3CCCCO3)cc2)CC1

nearest known ligand 0.45

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ HSD11B1 P28845 1/20 0.38
▸ MEN1 O00255 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ TNK2 Q07912 3/20 0.35
▸ ADORA3 P0DMS8 1/20 0.34
▸ DHFR P00374 1/20 0.32
▸ NPC1 O15118 1/20 0.32
▸ RAB9A P51151 1/20 0.32
▸ NPY1R P25929 1/20 0.31
▸ NPY2R P49146 1/20 0.31
▸ NPY4R P50391 1/20 0.31
▸ NPY5R Q15761 1/20 0.31
▸ ACP1 P24666 1/20 0.31
▸ KDM4C Q9H3R0 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12893186 0.91 HSD11B1 (0.41) HSD11B1MEN1KMT2ATNK2ADORA3
SCHEMBL15869168 0.83 TNK2 (0.37) HSD11B1MEN1KMT2ATNK2ADORA3
SCHEMBL19442919 0.81 ALDH1A1 (0.47) MEN1KMT2ANPC1RAB9A
SCHEMBL3500438 0.78 TNK2 (0.44) HSD11B1MEN1KMT2ATNK2DHFR
SCHEMBL1457107 0.74 NPY1R (0.43) HSD11B1MEN1KMT2ATNK2DHFR
SCHEMBL7231933 0.74 NPY1R (0.54) HSD11B1MEN1KMT2ATNK2DHFR
SCHEMBL4382295 0.74 MEN1 (0.45) HSD11B1MEN1KMT2ATNK2DHFR
SCHEMBL15869205 0.74 SLC6A4 (0.44) ADORA3
SCHEMBL1516026 0.74 HSD11B1 (0.42) HSD11B1MEN1KMT2ATNK2DHFR
SCHEMBL813805 0.74 NPC1 (0.46) HSD11B1MEN1KMT2ATNK2DHFR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
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