SCHEMBL15869211

SCHEMBL15869211

CC(C)(C)Oc1ccc(C2(c3ccc(OC(C)(C)C)cc3)CCCCC2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SLC6A4 P31645 6/20 0.61
▸ SLC6A3 Q01959 6/20 0.61
▸ SLC6A2 P23975 2/20 0.61
▸ ADORA3 P0DMS8 1/20 0.59
▸ ESR1 P03372 4/20 0.48
▸ ESR2 Q92731 4/20 0.48
▸ ALDH1A1 P00352 2/20 0.48
▸ L3MBTL1 Q9Y468 1/20 0.48
▸ PSMB1 P20618 1/20 0.45
▸ PSMB5 P28074 1/20 0.45
▸ PSMB2 P49721 1/20 0.45
▸ GRIN1 Q05586 1/20 0.41
▸ GRIN2A Q12879 1/20 0.41
▸ GRIN2B Q13224 1/20 0.41
▸ LMNA P02545 1/20 0.40
▸ MAPT P10636 1/20 0.40
▸ ALOX12 P18054 1/20 0.40
▸ HTT P42858 1/20 0.40
▸ BACE1 P56817 2/20 0.39
▸ ACHE P22303 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15869212 0.98 SLC6A4 (0.58) SLC6A4SLC6A3SLC6A2ADORA3ESR1
SCHEMBL12204977 0.92 ESR1 (0.65) SLC6A4SLC6A3SLC6A2ADORA3ESR1
SCHEMBL20959904 0.86 SLC6A4 (0.49) SLC6A4SLC6A3SLC6A2ADORA3ESR1
SCHEMBL19872008 0.85 ADORA3 (0.60) SLC6A4SLC6A3SLC6A2ADORA3ESR1
SCHEMBL12101644 0.85 ADORA3 (0.56) SLC6A4SLC6A3SLC6A2ADORA3ESR1
SCHEMBL19200571 0.84 SLC6A4 (0.47) SLC6A4SLC6A3SLC6A2ADORA3ESR1
SCHEMBL21785623 0.83 ADORA3 (0.54) SLC6A4SLC6A3SLC6A2ADORA3ESR1
SCHEMBL20671319 0.82 ADORA3 (0.65) SLC6A4SLC6A3SLC6A2ADORA3ESR1
SCHEMBL19431650 0.82 ADORA3 (0.65) SLC6A4SLC6A3SLC6A2ADORA3ESR1
SCHEMBL7741572 0.81 SLC6A4 (0.58) SLC6A4SLC6A3SLC6A2ADORA3GRIN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
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