Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.42 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 5/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6840624 | 0.84 | EPHX2 (0.46) | EPHX2EPHX1HSD11B1L3MBTL1 | |
| SCHEMBL365664 | 0.82 | EPHX2 (0.38) | EPHX2EPHX1HSD11B1 | |
| SCHEMBL15470614 | 0.79 | EPHX2 (0.39) | EPHX2EPHX1HSD11B1 | |
| SCHEMBL6448880 | 0.78 | EPHX2 (0.38) | EPHX2EPHX1HSD11B1CYP2C9 | |
| SCHEMBL15910721 | 0.78 | EPHX2 (0.34) | EPHX2EPHX1GAAHSD11B1L3MBTL1 | |
| SCHEMBL19561625 | 0.78 | EPHX2 (0.34) | EPHX2EPHX1HSD11B1CYP2C9L3MBTL1 | |
| SCHEMBL13144964 | 0.77 | EPHX2 (0.37) | EPHX2EPHX1HSD11B1L3MBTL1 | |
| SCHEMBL15910722 | 0.76 | L3MBTL1 (0.35) | EPHX2EPHX1GAAHSD11B1L3MBTL1 | |
| SCHEMBL11890191 | 0.74 | EPHX2 (0.35) | EPHX2EPHX1HSD11B1L3MBTL1 | |
| SCHEMBL26014451 | 0.74 | EPHX2 (0.32) | EPHX2HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10915022-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-02-09 | — | — | US | disclosed |
| US-20170322490-A1 | PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| US-9411230-B2 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-09 | — | — | US | disclosed |
| US-20140212796-A1 | PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-07-31 | — | — | US | disclosed |