SCHEMBL15911005

SCHEMBL15911005

Cc1ccc2c(ccc3ccccc32)c1O

nearest known ligand 0.80

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPRT1 P00492 3/20 0.58
CYP2A6 P11509 3/20 0.54
CYP1A2 P05177 3/20 0.54
TSHR P16473 3/20 0.54
ALDH1A1 P00352 4/20 0.50
HSD17B10 Q99714 3/20 0.50
TDP1 Q9NUW8 1/20 0.50
LMNA P02545 1/20 0.50
HTT P42858 1/20 0.50
LCK P06239 1/20 0.49
FYN P06241 1/20 0.49
ADORA3 P0DMS8 1/20 0.49
MAPT P10636 1/20 0.49
ACHE P22303 1/20 0.49
SLC6A2 P23975 1/20 0.49
AHR P35869 1/20 0.49
PTPN22 Q9Y2R2 1/20 0.48
PKM P14618 1/20 0.47
HPGD P15428 2/20 0.46
CYP3A4 P08684 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL33727 0.89 CYP2A6 (0.60) CYP2A6CYP1A2TSHRALDH1A1HSD17B10
Hydrochloric Acid SCHEMBL30153511 0.89 CYP2A6 (0.60) CYP2A6CYP1A2TSHRALDH1A1HSD17B10
Methyl Alcohol SCHEMBL28872570 0.87 CYP2A6 (0.58) CYP2A6CYP1A2TSHRALDH1A1HSD17B10
Dimethylamine SCHEMBL10431884 0.83 CYP2A6 (0.54) CYP2A6CYP1A2TSHRALDH1A1HSD17B10
Chrysene SCHEMBL27805598 0.82 HPRT1 (0.70) HPRT1CYP2A6CYP1A2TSHRALDH1A1
Pyrene SCHEMBL2167405 0.82 ALDH1A1 (0.55) CYP2A6CYP1A2TSHRALDH1A1HSD17B10
1-Naphthol SCHEMBL8960709 0.80 CYP1A2 (0.65) CYP2A6CYP1A2TSHRALDH1A1HSD17B10
SCHEMBL15910812 0.80 ALDH1A1 (0.50) HPRT1CYP2A6CYP1A2TSHRALDH1A1
Acetic Acid SCHEMBL457702 0.80 LDHA (0.56) CYP2A6CYP1A2TSHRALDH1A1MAPT
SCHEMBL9173373 0.79 TSHR (0.54) CYP2A6CYP1A2TSHRALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106574190-A Improved process for recovering valuable components from catalytic fast pyrolysis process 阿内洛技术股份有限公司 2017-04-19 CN disclosed
US-20140246400-A1 RESIN HAVING FLUORENE STRUCTURE AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-09-04 US disclosed
EP-2762513-A1 RESIN HAVING FLUORENE STRUCTURE AND UNDERLAYER FILM-FORMING MATERIAL FOR LITHOGRAPHY Mitsubishi Gas Chemical Company, Inc. (JP) 2014-08-06 EP disclosed