SCHEMBL15914852

SCHEMBL15914852

CCCC[Si](C(C)CC)(C(C)CC)C(C)CC

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.33
LMNA P02545 1/20 0.32
TRPM8 Q7Z2W7 2/20 0.31
OPRM1 P35372 1/20 0.31
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15914905 0.90 TSHR (0.40) TSHRLMNATRPM8OPRM1THRB
SCHEMBL15915868 0.82 TSHR (0.30) TSHR
SCHEMBL15914659 0.77 TSHR (0.35) TSHRLMNAOPRM1THRB
SCHEMBL14950661 0.76 TRPM8 (0.30) TSHRLMNATRPM8
SCHEMBL2275292 0.74
SCHEMBL18221773 0.74 TRPM8 (0.33) TSHRTRPM8
SCHEMBL2102646 0.74
SCHEMBL2019995 0.74 ALDH1A1 (0.31) TSHRLMNA
SCHEMBL29139409 0.74
SCHEMBL15915235 0.72 TRPM8 (0.31) TRPM8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed