SCHEMBL15915019

SCHEMBL15915019

CCCC[Si](C1CCCCC1)(C1CCCCC1)C1CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.44
CNR1 P21554 4/20 0.38
CNR2 P34972 4/20 0.38
NAAA Q02083 1/20 0.36
EPHX1 P07099 9/20 0.35
EPHX2 P34913 2/20 0.34
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15914934 0.98 CYP1A2 (0.41) CYP1A2CNR1CNR2NAAAEPHX1
SCHEMBL15914695 0.91 NAAA (0.42) CYP1A2CNR1CNR2NAAAEPHX1
SCHEMBL15915133 0.88 CNR1 (0.39) CYP1A2CNR1CNR2NAAAEPHX1
SCHEMBL15915092 0.85 CYP1A2 (0.37) CYP1A2NAAAEPHX1
SCHEMBL15915796 0.82 CYP1A2 (0.33) CYP1A2
SCHEMBL10401491 0.82
SCHEMBL3898468 0.81 CYP1A2 (0.44) CYP1A2CNR1CNR2NAAAEPHX1
SCHEMBL17565668 0.79 CYP1A2 (0.43) CYP1A2CNR1CNR2NAAAEPHX1
SCHEMBL8955343 0.77 CYP1A2 (0.46) CYP1A2CNR1CNR2NAAAEPHX1
SCHEMBL9331149 0.77 CYP1A2 (0.41) CYP1A2CNR1CNR2NAAAEPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed
CN-103781937-A Film-forming material, sealing film using same, and use of sealing film TOSOH CORP 2014-05-07 CN disclosed