SCHEMBL15915796

SCHEMBL15915796

CCC[Si](C1CCCC1)(C1CCCC1)C1CCCC1

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.33
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA4 P22748 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15915092 0.97 CYP1A2 (0.37) CYP1A2CA1CA2CA4
SCHEMBL15914934 0.84 CYP1A2 (0.41) CYP1A2
SCHEMBL15915019 0.82 CYP1A2 (0.44) CYP1A2
SCHEMBL15915133 0.80 CNR1 (0.39) CYP1A2
SCHEMBL15914695 0.79 NAAA (0.42) CYP1A2
SCHEMBL15864532 0.78 CYP1A2 (0.33) CYP1A2CA1CA2CA4
SCHEMBL15915251 0.77 NOS3 (0.33) CYP1A2
SCHEMBL10401491 0.77
SCHEMBL3894331 0.76 CYP1A2 (0.37) CYP1A2CA1CA2CA4
SCHEMBL22006126 0.76 CYP1A2 (0.32) CYP1A2CA1CA2CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed