SCHEMBL15915362

SCHEMBL15915362

CCC[Si](CCC)(O[Si](CCC)(CCC)C1CCCC1)C1CCCC1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15915192 0.98 CYP1A2 (0.33) CYP1A2
SCHEMBL15914957 0.86 CYP1A2 (0.37) CYP1A2
SCHEMBL18208004 0.85 CYP1A2 (0.40) CYP1A2
SCHEMBL15914633 0.80
SCHEMBL9622573 0.79 CYP1A2 (0.30) CYP1A2
SCHEMBL15915260 0.78 SHBG (0.32) CYP1A2
SCHEMBL15915172 0.76 CYP1A2 (0.30) CYP1A2
SCHEMBL12385357 0.74 CYP1A2 (0.33) CYP1A2
SCHEMBL12385354 0.73 CYP1A2 (0.32) CYP1A2
SCHEMBL15864532 0.72 CYP1A2 (0.33) CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed