SCHEMBL1592379

SCHEMBL1592379

CCCCCCCCCCOC(=O)Nc1ccc(C(=O)O)c(O)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 9/20 0.53
HPGD P15428 7/20 0.53
NPC1 O15118 7/20 0.53
SMN1; SMN2 Q16637 6/20 0.53
CYP1A2 P05177 3/20 0.53
CYP2C9 P11712 3/20 0.53
CYP2C19 P33261 3/20 0.53
PPARA Q07869 2/20 0.52
MAPK1 P28482 2/20 0.52
CASP3 P42574 2/20 0.52
SENP8 Q96LD8 2/20 0.52
SENP7 Q9BQF6 2/20 0.52
SENP6 Q9GZR1 2/20 0.52
CYP2D6 P10635 1/20 0.52
ALOX15 P16050 1/20 0.52
HSD17B10 Q99714 1/20 0.52
LMNA P02545 1/20 0.51
KDM4E B2RXH2 2/20 0.50
ALDH1A1 P00352 2/20 0.50
EPHX2 P34913 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8653828 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL8601513 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
Hydroxyl Radical SCHEMBL28790270 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1593183 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1592377 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1592889 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL8654517 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1592334 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1592407 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1592296 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2954373-B1 CHEMICAL COATING FOR A LASER-MARKABLE MATERIAL FUJIFILM HUNT CHEMICALS US INC (US) 2019-04-24 EP disclosed
EP-2954373-A1 CHEMICAL COATING FOR A LASER-MARKABLE MATERIAL Fujifilm Hunt Chemicals US, Inc. (US) 2015-12-16 EP disclosed
WO-2014124052-A1 CHEMICAL COATING FOR A LASER-MARKABLE MATERIAL FUJIFILM HUNT CHEMICALS, INC. (US) 2014-08-14 WO disclosed
US-20130216947-A1 CHEMICAL COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL FUJIFILM HUNT CHEMICALS U.S.A., INC. 2013-08-22 US disclosed
US-8410019-B2 Modifying agent for coating composition for producing protective layer in thermosensitive recording medium, coating composition for protective layer in thermosensitive recording medium, and thermosensitive recording medium using the same DIC CORPORATION (JP) 2013-04-02 US disclosed
US-8349766-B2 Thermosensitive recording material FUJIFILM CORPORATION (JP) 2013-01-08 US disclosed
EP-1982838-B1 MODIFYING AGENT FOR COATING AGENT FOR FORMING PROTECTION LAYER OF HEAT SENSITIVE RECORDING MEDIUM, COATING AGENT FOR FORMING PROTECTION LAYER OF HEAT SENSITIVE RECORDING MEDIUM, AND HEAT SENSITIVE RECORDING MEDIUM USING SAME DAINIPPON INK & CHEMICALS (JP) 2012-11-07 EP disclosed
US-8039419-B2 Recording layer on support; hollow particles and coloring material FUJIFILM CORPORATION (JP) 2011-10-18 US disclosed
US-20110092365-A1 THERMOSENSITIVE RECORDING MATERIAL FUJIFILM CORPORATION (JP) 2011-04-21 US disclosed
US-20100048395-A1 THERMOSENSITIVE RECORDING MATERIAL FUJIFILM CORPORATION (JP) 2010-02-25 US disclosed
US-5804529-A HEAT SENSITIVE RECORDING LAYER; BETWEEN TWO POLYMERIC OXYGEN BARRIER LAYERS MITSUBISHI PAPER MILLS LTD. (JP) 1998-09-08 US disclosed
EP-0675002-B1 Heat-sensitive recording material FUJI PHOTO FILM CO LTD (JP) 1998-02-25 EP disclosed
EP-0534257-B1 Salicylic acid derivatives, the process for preparing the same and the heat-sensitive recording materials comprising thereof MITSUI TOATSU CHEMICALS (JP) 1997-03-12 EP disclosed
US-5476957-A Dye for heat sensitive recording MITSUI TOATSU CHEMICALS, INC. (JP) 1995-12-19 US disclosed
US-5466655-A STORAGE STABILITY MITSUBISHI PAPER MILLS LIMITED (JP) 1995-11-14 US disclosed
EP-0675002-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1995-10-04 EP disclosed
EP-0630758-A2 Heat-sensitive recording material MITSUBISHI PAPER MILLS, LTD. (JP) 1994-12-28 EP disclosed
US-5346878-A Preservation stability of white portions and images MITSUI TOATSU CHEMICALS, INC. (JP) 1994-09-13 US disclosed
US-5306688-A Color-forming, electron donating compound and electron accepting compound; storage stability of uncolored portion MITSUI TOATSU CHEMICALS, INC. (JP) 1994-04-26 US disclosed
EP-0534257-A1 Salicylic acid derivatives, the process for preparing the same and the heat-sensitive recording materials comprising thereof MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-03-31 EP disclosed