SCHEMBL1592407

SCHEMBL1592407

CCCCCCCCCCCOC(=O)Nc1ccc(C(=O)O)c(O)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 9/20 0.53
▸ HPGD P15428 7/20 0.53
▸ NPC1 O15118 7/20 0.53
▸ SMN1; SMN2 Q16637 6/20 0.53
▸ CYP1A2 P05177 3/20 0.53
▸ CYP2C9 P11712 3/20 0.53
▸ CYP2C19 P33261 3/20 0.53
▸ PPARA Q07869 2/20 0.52
▸ MAPK1 P28482 2/20 0.52
▸ CASP3 P42574 2/20 0.52
▸ SENP8 Q96LD8 2/20 0.52
▸ SENP7 Q9BQF6 2/20 0.52
▸ SENP6 Q9GZR1 2/20 0.52
▸ CYP2D6 P10635 1/20 0.52
▸ ALOX15 P16050 1/20 0.52
▸ HSD17B10 Q99714 1/20 0.52
▸ LMNA P02545 1/20 0.51
▸ KDM4E B2RXH2 2/20 0.50
▸ ALDH1A1 P00352 2/20 0.50
▸ EPHX2 P34913 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8653828 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
Hydroxyl Radical SCHEMBL28790270 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1592334 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL8654517 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1592889 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1593183 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1592379 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1592377 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL8601513 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2
SCHEMBL1592296 1.00 RAB9A (0.53) RAB9AHPGDNPC1SMN1; SMN2CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2954373-B1 CHEMICAL COATING FOR A LASER-MARKABLE MATERIAL FUJIFILM HUNT CHEMICALS US INC (US) 2019-04-24 — — EP disclosed
EP-2954373-A1 CHEMICAL COATING FOR A LASER-MARKABLE MATERIAL Fujifilm Hunt Chemicals US, Inc. (US) 2015-12-16 — — EP disclosed
WO-2014124052-A1 CHEMICAL COATING FOR A LASER-MARKABLE MATERIAL FUJIFILM HUNT CHEMICALS, INC. (US) 2014-08-14 — — WO disclosed
US-20130216947-A1 CHEMICAL COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL FUJIFILM HUNT CHEMICALS U.S.A., INC. 2013-08-22 — — US disclosed
US-8349766-B2 Thermosensitive recording material FUJIFILM CORPORATION (JP) 2013-01-08 — — US disclosed
US-8039419-B2 Recording layer on support; hollow particles and coloring material FUJIFILM CORPORATION (JP) 2011-10-18 — — US disclosed
US-20110092365-A1 THERMOSENSITIVE RECORDING MATERIAL FUJIFILM CORPORATION (JP) 2011-04-21 — — US disclosed
US-20100048395-A1 THERMOSENSITIVE RECORDING MATERIAL FUJIFILM CORPORATION (JP) 2010-02-25 — — US disclosed
US-20080058207-A1 Recording layer on support; hollow particles and coloring material FUJIFILM CORPORATION (JP) 2008-03-06 — — US disclosed
EP-0630758-B1 Heat-sensitive recording material MITSUBISHI PAPER MILLS LTD (JP) 1998-10-07 — — EP disclosed
US-5476957-A Dye for heat sensitive recording MITSUI TOATSU CHEMICALS, INC. (JP) 1995-12-19 — — US disclosed
US-5466655-A STORAGE STABILITY MITSUBISHI PAPER MILLS LIMITED (JP) 1995-11-14 — — US disclosed
EP-0630758-A2 Heat-sensitive recording material MITSUBISHI PAPER MILLS, LTD. (JP) 1994-12-28 — — EP disclosed
US-5346878-A Preservation stability of white portions and images MITSUI TOATSU CHEMICALS, INC. (JP) 1994-09-13 — — US disclosed
US-5306688-A Color-forming, electron donating compound and electron accepting compound; storage stability of uncolored portion MITSUI TOATSU CHEMICALS, INC. (JP) 1994-04-26 — — US disclosed
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