SCHEMBL15925438

SCHEMBL15925438

CC(C)N(C(C)C)S(=O)(=O)C(C)(C)C(C)(C)S(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15925424 0.80
SCHEMBL15925443 0.77 CA1 (0.32)
SCHEMBL16687723 0.77
SCHEMBL9609289 0.71 ALDH1A1 (0.32)
SCHEMBL16519690 0.70 HTT (0.31)
SCHEMBL9609356 0.70 ALDH1A1 (0.31)
SCHEMBL12891811 0.67
SCHEMBL15233276 0.65
SCHEMBL20087415 0.64 CA5A (0.33)
SCHEMBL12345729 0.64 CA5A (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2353048-B1 PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD FUJIFILM CORP (JP) 2015-02-25 EP disclosed
EP-2157477-B1 USE OF A RESIST COMPOSITION FOR NEGATIVE WORKING-TYPE DEVELOPMENT, AND METHOD FOR PATTERN FORMATION USING THE RESIST COMPOSITION FUJIFILM CORP (JP) 2014-08-06 EP disclosed