SCHEMBL15929669

SCHEMBL15929669

Cc1ccc(S(=O)(=O)c2ccc(Oc3ccc(Oc4ccc(S(=O)(=O)c5ccc(-n6c(=O)n(C)c7ccccc76)cc5)cc4)cc3OCC3CO3)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NTRK1 P04629 6/20 0.43
NTRK3 Q16288 6/20 0.43
NTRK2 Q16620 6/20 0.43
ALDH1A1 P00352 3/20 0.41
PKM P14618 2/20 0.41
LMNA P02545 1/20 0.41
GAA P10253 1/20 0.41
TRIM24 O15164 5/20 0.39
BRPF1 P55201 5/20 0.39
BRD1 O95696 4/20 0.39
HTT P42858 2/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
MEN1 O00255 1/20 0.38
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
KMT2A Q03164 1/20 0.38
GLA P06280 1/20 0.34
GRM2 Q14416 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15929656 0.87 NTRK1 (0.46) NTRK1NTRK3NTRK2ALDH1A1LMNA
SCHEMBL15929690 0.84 TRIM24 (0.46) NTRK1NTRK3NTRK2ALDH1A1TRIM24
SCHEMBL15929647 0.84 HTT (0.47) NTRK1NTRK3NTRK2ALDH1A1TRIM24
SCHEMBL15929654 0.81 HTT (0.42) NTRK1NTRK3NTRK2ALDH1A1PKM
SCHEMBL15929649 0.81 HTT (0.57) ALDH1A1PKMGAATRIM24BRPF1
SCHEMBL15929655 0.81 HTT (0.45) NTRK1NTRK3NTRK2ALDH1A1TRIM24
SCHEMBL15929651 0.80 HTT (0.56) NTRK1NTRK2ALDH1A1TRIM24BRPF1
SCHEMBL15929671 0.79 TRIM24 (0.40) NTRK1NTRK3NTRK2ALDH1A1TRIM24
SCHEMBL15929659 0.78 HTT (0.43) ALDH1A1TRIM24BRPF1BRD1HTT
SCHEMBL15929675 0.78 PKM (0.59) ALDH1A1PKMLMNAGAAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9035287-B2 Polymeric materials for use in metal-oxide-semiconductor field-effect transistors POLYERA CORPORATION (US) 2015-05-19 US disclosed
US-20140217395-A1 Polymeric Materials for Use in Metal-Oxide-Semiconductor Field-Effect Transistors POLYERA CORPORATION (US) 2014-08-07 US disclosed