SCHEMBL15929675

SCHEMBL15929675

COc1ccc(Oc2ccc(S(=O)(=O)c3ccc(C)cc3)cc2)cc1OCC1CO1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PKM P14618 3/20 0.59
ALDH1A1 P00352 4/20 0.55
GAA P10253 2/20 0.55
LMNA P02545 1/20 0.55
HTT P42858 2/20 0.47
TDP1 Q9NUW8 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.45
AR P10275 1/20 0.41
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
POLB P06746 1/20 0.40
TSHR P16473 1/20 0.40
MAPK1 P28482 1/20 0.40
GLA P06280 1/20 0.39
MMP1 P03956 1/20 0.38
MMP2 P08253 1/20 0.38
RAPGEF4 Q8WZA2 1/20 0.38
NR1I2 O75469 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15929602 0.82 HTT (0.63) PKMALDH1A1GAALMNAHTT
SCHEMBL6296972 0.80 ALDH1A1 (0.85) PKMALDH1A1GAALMNAHTT
SCHEMBL8064302 0.79 ALDH1A1 (0.56) PKMALDH1A1GAALMNASMN1; SMN2
SCHEMBL15929669 0.78 NTRK1 (0.43) PKMALDH1A1GAALMNAHTT
SCHEMBL15929689 0.78 HTT (0.50) PKMALDH1A1GAALMNAHTT
SCHEMBL6302232 0.75 PKM (1.00) PKMALDH1A1GAALMNAHTT
SCHEMBL6297182 0.74 PKM (0.72) PKMALDH1A1GAALMNAHTT
SCHEMBL6301481 0.74 ALDH1A1 (0.72) PKMALDH1A1GAALMNATDP1
SCHEMBL3144323 0.73 ALDH1A1 (0.59) PKMALDH1A1GAALMNATDP1
SCHEMBL29847477 0.73 ALDH1A1 (0.59) PKMALDH1A1GAALMNATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170227846-A1 Photopatternable Compositions and Methods of Fabricating Transistor Devices Using Same USINVEST LLC 2017-08-10 US disclosed
US-9035287-B2 Polymeric materials for use in metal-oxide-semiconductor field-effect transistors POLYERA CORPORATION (US) 2015-05-19 US disclosed
US-20140217395-A1 Polymeric Materials for Use in Metal-Oxide-Semiconductor Field-Effect Transistors POLYERA CORPORATION (US) 2014-08-07 US disclosed