SCHEMBL15935647

SCHEMBL15935647

CC(C)(C)CC(C)(C)C(=O)OC(C(F)(F)F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ABHD6 Q9BV23 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21282139 0.84 ABHD6 (0.31) ABHD6
SCHEMBL2681158 0.82 ABHD6 (0.32) ABHD6
SCHEMBL13966958 0.81 PLA2G7 (0.30) ABHD6
SCHEMBL2876134 0.81
SCHEMBL20852017 0.80 ABHD6 (0.31) ABHD6
SCHEMBL22051424 0.79
SCHEMBL13966977 0.79
SCHEMBL15942732 0.79
SCHEMBL18643695 0.79
SCHEMBL24952052 0.78 ELANE (0.40) ABHD6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2014119698-A1 PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-07 WO disclosed