SCHEMBL15935676

SCHEMBL15935676

CC1C2CC(C(=O)C(F)(F)S(=O)(=O)O)C(C2)C1C1CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18408732 0.81 ALDH1A1 (0.31)
SCHEMBL3435337 0.77 ALDH1A1 (0.36)
SCHEMBL12256447 0.72 ALDH1A1 (0.31)
SCHEMBL12919719 0.65 ALDH1A1 (0.44)
SCHEMBL12409697 0.65 POLB (0.33)
SCHEMBL12256434 0.64 POLB (0.42)
SCHEMBL13636354 0.63
SCHEMBL14302060 0.61 ALDH1A1 (0.31)
SCHEMBL21731857 0.59
SCHEMBL686545 0.57 ALDH1A1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2014119698-A1 PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-07 WO disclosed