SCHEMBL12409697

SCHEMBL12409697

CC1C2CC(C(=O)NCCNC(=O)C(F)(F)S(=O)(=O)O)C(C2)C1C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14560929 0.72 ALDH1A1 (0.50) POLB
SCHEMBL12409818 0.71 KDM4E (0.47) POLB
SCHEMBL12409683 0.68 EPHX1 (0.40) POLB
SCHEMBL108138 0.68 CA1 (0.31)
SCHEMBL2754928 0.66 EPHX1 (0.48) POLB
SCHEMBL15935676 0.65
SCHEMBL12429895 0.65 EPHX2 (0.31)
SCHEMBL12333879 0.64 EPHX1 (0.65) POLB
SCHEMBL10218941 0.64 EPHX1 (0.59) POLB
SCHEMBL12409793 0.64 ALDH1A1 (0.37) POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8378016-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-02-19 US disclosed
US-20110165519-A1 RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME ANDO NOBUO 2011-07-07 US disclosed
US-7932334-B2 Resin suitable for an acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-26 US disclosed
US-20070149702-A1 Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED 2007-06-28 US disclosed