SCHEMBL15935741

SCHEMBL15935741

CCCCSCC(=O)c1ccc(O)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B3 P37058 8/20 0.61
NPC1 O15118 1/20 0.48
RAB9A P51151 1/20 0.48
ESR1 P03372 4/20 0.48
ESR2 Q92731 2/20 0.48
TSHR P16473 2/20 0.47
LMNA P02545 1/20 0.47
CYP1A2 P05177 1/20 0.47
CYP2D6 P10635 1/20 0.47
MAPK1 P28482 1/20 0.47
CYP2C19 P33261 1/20 0.47
NR1H2 P55055 1/20 0.47
RNASEL Q05823 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
ALDH1A1 P00352 4/20 0.47
MAPT P10636 1/20 0.47
PTPN1 P18031 1/20 0.44
CES1 P23141 1/20 0.43
TDP1 Q9NUW8 2/20 0.43
KDM4E B2RXH2 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17399693 0.93 HSD17B3 (0.63) HSD17B3NPC1RAB9AESR1ESR2
SCHEMBL14534944 0.85 HDAC3 (0.53) NPC1RAB9ALMNASMN1; SMN2ALDH1A1
SCHEMBL8756244 0.84 ALDH1A1 (0.59) NPC1RAB9ALMNAMAPK1SMN1; SMN2
SCHEMBL14534940 0.82 HDAC3 (0.58) NPC1RAB9ASMN1; SMN2ALDH1A1MAPT
SCHEMBL18737683 0.81 HDAC3 (0.50) HSD17B3NPC1RAB9AALDH1A1MAPT
SCHEMBL10226377 0.80 GSK3B (0.51) RAB9ALMNAMAPK1SMN1; SMN2ALDH1A1
SCHEMBL14547799 0.80 HDAC3 (0.60) NPC1RAB9ALMNASMN1; SMN2ALDH1A1
SCHEMBL2522380 0.79 ALDH1A1 (0.58) NPC1RAB9ALMNAMAPK1SMN1; SMN2
SCHEMBL14463213 0.79 ALDH1A1 (0.55) TSHRLMNASMN1; SMN2ALDH1A1MAPT
SCHEMBL14463212 0.79 MAPT (0.40) HSD17B3TSHRLMNAMAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9405197-B2 Pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2016-08-02 US disclosed
EP-1536285-B1 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition FUJIFILM CORP (JP) 2016-01-06 EP disclosed
US-20150160559-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-06-11 US disclosed
WO-2014133187-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND FUJIFILM CORPORATION (JP) 2014-09-04 WO disclosed
WO-2014119698-A1 PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-07 WO disclosed