SCHEMBL1595849

SCHEMBL1595849

CCCCO[Si](C)(CCC)OCCCC

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.38
ADRB1 P08588 1/20 0.38
ADRB3 P13945 1/20 0.38
TSHR P16473 2/20 0.33
CYP3A4 P08684 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.32
ALDH1A1 P00352 1/20 0.32
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
LMNA P02545 1/20 0.30
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19809375 0.92 CA1 (0.33) TSHRALDH1A1CA1CA2
SCHEMBL703594 0.92 ADRB2 (0.39) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL706695 0.90 ADRB2 (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL705364 0.90 ADRB2 (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL28805966 0.90 ADRB2 (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL28609322 0.88 ADRB2 (0.33) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL11332073 0.85 THRB (0.38) ADRB2ADRB1ADRB3TSHRALDH1A1
SCHEMBL27904666 0.85 THRB (0.38) ADRB2ADRB1ADRB3TSHRALDH1A1
SCHEMBL3614310 0.85 ADRB2 (0.35) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL17209128 0.84 THRB (0.35) TSHRALDH1A1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118426260-A Photosensitive coloring composition, film, color filter, solid-state imaging element, and image display device 爱天思株式会社 2024-08-02 CN disclosed
EP-4398035-A1 WAFER EDGE PROTECTIVE-FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING Nissan Chemical Corporation (JP) 2024-07-10 EP disclosed
EP-4359459-A1 COATING AGENTS AND COATINGS THAT ARE OBTAINABLE THEREFROM AND HAVE IMPROVED RESISTANCE TO SOILING AND (SELF-)CLEANING PROPERTIES Covestro Deutschland AG (DE) 2024-05-01 EP disclosed
WO-2023190825-A1 SEALING DEVICE NOK株式会社 2023-10-05 WO disclosed
WO-2023117614-A1 MULTILAYER CONSTRUCTION ON METAL SUBSTRATES BASED ON POLYASPARATE COATINGS COVESTRO DEUTSCHLAND AG (DE) 2023-06-29 WO disclosed
WO-2022268744-A1 COATING AGENTS AND COATINGS THAT ARE OBTAINABLE THEREFROM AND HAVE IMPROVED RESISTANCE TO SOILING AND (SELF-)CLEANING PROPERTIES COVESTRO DEUTSCHLAND AG (DE) 2022-12-29 WO disclosed
US-20210395462-A1 FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2021-12-23 US disclosed
EP-3727687-A1 METHOD FOR PREPARING MIXED SILANE-TERMINATED POLYMERS Covestro Deutschland AG (DE) 2020-10-28 EP disclosed
EP-3168842-B1 SCINTILLATOR PANEL, RADIATION DETECTOR, AND MANUFACTURING METHOD THEREFOR TORAY INDUSTRIES (JP) 2020-01-29 EP disclosed
EP-1870439-B1 Conductive tin oxide sol and process for producing same NISSAN CHEMICAL CORP (JP) 2018-10-03 EP disclosed
EP-1641063-A1 POLYMER ELECTROLYTE, POLYMER ELECTROLYTE MEMBRANE THEREFROM, MEMBRANE ELECTRODE ASSEMBLY AND POLYMER ELECTROLYTE FUEL CELL TORAY INDUSTRIES, INC. (JP) 2006-03-29 EP disclosed
US-20050239907-A1 Anhydrous zinc antimonate sol and process for producing same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-10-27 US disclosed
EP-1589078-A1 Anhydrous zinc antimonate sol and process for producing same NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) 2005-10-26 EP disclosed
US-6866949-B2 Substrate film, gas barrier film, and display using the same DAI NIPPON PRINTING CO., LTD. (JP) 2005-03-15 US disclosed
US-20050012078-A1 Metal oxide particle and process for producing same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-01-20 US disclosed
US-20040077757-A1 Coating composition for use in producing an insulating thin film ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-04-22 US disclosed
US-20040018364-A1 Substrate film, gas barrier film, and display using the same DAI NIPPON PRINTING CO., LTD. (JP) 2004-01-29 US disclosed
EP-1218422-A1 AZIDOSILANE-MODIFIED, MOISTURE-CURABLE POLYOLEFIN POLYMERS, PROCESS FOR MAKING, AND ARTICLES OBTAINED THEREFROM THE DOW CHEMICAL COMPANY (US) 2002-07-03 EP disclosed
WO-2001010914-A1 AZIDOSILANE-MODIFIED, MOISTURE-CURABLE POLYOLEFIN POLYMERS, PROCESS FOR MAKING, AND ARTICLES OBTAINED THEREFROM THE DOW CHEMICAL COMPANY (US) 2001-02-15 WO disclosed
US-5645901-A RESIN SUBSTRATE, CURED COATING LAMINATED TO SUBSTRATE, SILOXANE CURED COATING CONTAINING FINE SILICA PARTICLES, AND INDIUM TIN OXIDE FILM SHARP KABUSHIKI KAISHA (JP) 1997-07-08 US disclosed