SCHEMBL15965191

SCHEMBL15965191

NCCCCCCCCCCCCCCCC[SiH3]

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 9/20 0.61
CA12 O43570 2/20 0.61
CA1 P00915 2/20 0.61
CA2 P00918 2/20 0.61
CA3 P07451 2/20 0.61
CA4 P22748 2/20 0.61
CA6 P23280 2/20 0.61
CA5A P35218 2/20 0.61
CA7 P43166 2/20 0.61
CA9 Q16790 2/20 0.61
CA14 Q9ULX7 2/20 0.61
CA5B Q9Y2D0 2/20 0.61
TSHR P16473 2/20 0.61
LMNA P02545 1/20 0.61
BLM P54132 1/20 0.61
NFKB1 P19838 1/20 0.54
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
ALDH1A1 P00352 1/20 0.44
EPHX1 P07099 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15965257 1.00 DNM1 (0.61) DNM1CA12CA1CA2CA3
SCHEMBL15965242 1.00 DNM1 (0.61) DNM1CA12CA1CA2CA3
SCHEMBL15965229 1.00
SCHEMBL15965189 1.00 DNM1 (0.61) DNM1CA12CA1CA2CA3
SCHEMBL15965319 1.00
SCHEMBL15965203 1.00 DNM1 (0.61) DNM1CA12CA1CA2CA3
SCHEMBL15965332 1.00 DNM1 (0.61) DNM1CA12CA1CA2CA3
SCHEMBL15965202 1.00 DNM1 (0.61) DNM1CA12CA1CA2CA3
SCHEMBL15965317 1.00 DNM1 (0.61) DNM1CA12CA1CA2CA3
SCHEMBL10764870 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117740969-A Indolibuprfen impurity detection method and application thereof 杭州志呈科技有限公司 2024-03-22 CN disclosed
CN-112305138-B Method for simultaneously determining content of lysine and glycine 蚌埠丰原医药科技发展有限公司 2023-01-31 CN disclosed
CN-112305138-A Method for simultaneously determining content of lysine and glycine 蚌埠丰原医药科技发展有限公司 2021-02-02 CN disclosed
US-9315670-B2 Composition for forming resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-19 US disclosed
US-20140235796-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-21 US disclosed