⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15965257 | 1.00 | DNM1 (0.61) | — | |
| SCHEMBL15965242 | 1.00 | DNM1 (0.61) | — | |
| SCHEMBL15965191 | 1.00 | DNM1 (0.61) | — | |
| SCHEMBL15965189 | 1.00 | DNM1 (0.61) | — | |
| SCHEMBL15965319 | 1.00 | — | — | |
| SCHEMBL15965203 | 1.00 | DNM1 (0.61) | — | |
| SCHEMBL15965332 | 1.00 | DNM1 (0.61) | — | |
| SCHEMBL15965202 | 1.00 | DNM1 (0.61) | — | |
| SCHEMBL15965317 | 1.00 | DNM1 (0.61) | — | |
| SCHEMBL10764870 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9315670-B2 | Composition for forming resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-20140235796-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-21 | — | — | US | disclosed |