Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 9/20 | 0.53 |
| ▸ | PTGES | O14684 | 1/20 | 0.51 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.51 |
| ▸ | CHKA | P35790 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1263730 | 0.83 | PTGES (0.68) | APPPTGESHDAC1CHKAALDH1A1 | |
| SCHEMBL595602 | 0.80 | APP (0.61) | APPPTGESHDAC1CHKAALDH1A1 | |
| SCHEMBL11020409 | 0.80 | APP (0.57) | APPPTGESHDAC1CHKAALDH1A1 | |
| SCHEMBL19958267 | 0.79 | APP (0.70) | APPPTGESHDAC1CHKAALDH1A1 | |
| SCHEMBL1263098 | 0.79 | ALDH1A1 (0.62) | APPPTGESHDAC1CHKAALDH1A1 | |
| SCHEMBL23302979 | 0.78 | PTGES (0.62) | APPPTGESHDAC1ALDH1A1KDM4E | |
| SCHEMBL11020593 | 0.78 | APP (0.56) | APPPTGESHDAC1CHKAALDH1A1 | |
| SCHEMBL1263398 | 0.78 | PTGES (0.62) | APPPTGESHDAC1ALDH1A1KDM4E | |
| SCHEMBL11001964 | 0.78 | PTGES (0.62) | APPPTGESHDAC1ALDH1A1KDM4E | |
| SCHEMBL7866225 | 0.78 | HDAC1 (0.54) | APPPTGESHDAC1CHKAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9315670-B2 | Composition for forming resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-20140235796-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-21 | — | — | US | disclosed |