SCHEMBL15965772

SCHEMBL15965772

CCC(F)(F)CCOC(=O)C1CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.44
ADRB2 P07550 1/20 0.39
ADRB1 P08588 1/20 0.39
ADRB3 P13945 1/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
HTT P42858 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.34
RECQL P46063 1/20 0.34
FKBP1A P62942 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10172734 0.81 ADRB2 (0.42) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL17479894 0.81 ADRB2 (0.42) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL15966351 0.80 ALDH1A1 (0.35) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL16213960 0.79 ADRB2 (0.43) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL9913286 0.77 ALDH1A1 (0.38) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL8631955 0.77 ALDH1A1 (0.53) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL148328 0.77 ALDH1A1 (0.53) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL205737 0.76 ALDH1A1 (0.50) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL8845363 0.76 ALDH1A1 (0.50) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL16213969 0.76 ADRB2 (0.41) ALDH1A1ADRB2ADRB1ADRB3MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075310-B2 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2015-07-07 US disclosed
US-20140234761-A1 PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-21 US disclosed