Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 9/20 | 0.58 |
| ▸ | TMEM97 | Q5BJF2 | 3/20 | 0.52 |
| ▸ | CARM1 | Q86X55 | 1/20 | 0.49 |
| ▸ | PRMT6 | Q96LA8 | 1/20 | 0.49 |
| ▸ | PRMT8 | Q9NR22 | 1/20 | 0.49 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.47 |
| ▸ | APP | P05067 | 2/20 | 0.47 |
| ▸ | BCHE | P06276 | 2/20 | 0.46 |
| ▸ | ACHE | P22303 | 2/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15966137 | 1.00 | SIGMAR1 (0.58) | SIGMAR1TMEM97CARM1PRMT6PRMT8 | |
| SCHEMBL15966135 | 1.00 | SIGMAR1 (0.58) | SIGMAR1TMEM97CARM1PRMT6PRMT8 | |
| SCHEMBL15966141 | 1.00 | SIGMAR1 (0.58) | SIGMAR1TMEM97CARM1PRMT6PRMT8 | |
| SCHEMBL15966134 | 0.98 | SIGMAR1 (0.60) | SIGMAR1TMEM97CARM1PRMT6PRMT8 | |
| SCHEMBL11117593 | 0.94 | SIGMAR1 (0.55) | SIGMAR1TMEM97CARM1PRMT6PRMT8 | |
| SCHEMBL11117996 | 0.87 | CARM1 (0.55) | SIGMAR1TMEM97CARM1PRMT6PRMT8 | |
| SCHEMBL9131293 | 0.83 | SIGMAR1 (0.73) | SIGMAR1CARM1PRMT6PRMT8ACHE | |
| SCHEMBL2326491 | 0.83 | SIGMAR1 (0.73) | SIGMAR1CARM1PRMT6PRMT8ACHE | |
| SCHEMBL7190739 | 0.83 | SIGMAR1 (0.73) | SIGMAR1CARM1PRMT6PRMT8ACHE | |
| SCHEMBL10352566 | 0.83 | SIGMAR1 (0.73) | SIGMAR1CARM1PRMT6PRMT8ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9315670-B2 | Composition for forming resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-20140235796-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-21 | — | — | US | disclosed |