Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | DNM1 | Q05193 | 5/20 | 0.36 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.36 |
| ▸ | ADH1B | P00325 | 1/20 | 0.35 |
| ▸ | ADH1C | P00326 | 1/20 | 0.35 |
| ▸ | ADH1A | P07327 | 1/20 | 0.35 |
| ▸ | ADH4 | P08319 | 1/20 | 0.35 |
| ▸ | ADH7 | P40394 | 1/20 | 0.35 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.35 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.34 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15966138 | 1.00 | LMNA (0.37) | LMNADNM1EPHX1ADH1BADH1C | |
| SCHEMBL25532936 | 0.98 | OPRM1 (0.36) | LMNADNM1EPHX1ADH1BADH1C | |
| SCHEMBL9173273 | 0.82 | LMNA (0.39) | LMNADNM1EPHX1ADH1BADH1C | |
| SCHEMBL18315367 | 0.82 | LMNA (0.39) | LMNADNM1EPHX1ADH1BADH1C | |
| SCHEMBL18315360 | 0.81 | PLA2G1B (0.38) | LMNADNM1ADH1BADH1CADH1A | |
| SCHEMBL18315363 | 0.81 | PLA2G1B (0.38) | LMNADNM1ADH1BADH1CADH1A | |
| SCHEMBL18315349 | 0.79 | OPRM1 (0.39) | LMNADNM1EPHX1ADH1BADH1C | |
| SCHEMBL18315350 | 0.78 | PLA2G1B (0.35) | LMNADNM1ADH1BADH1CADH1A | |
| SCHEMBL27774861 | 0.77 | EPHX1 (0.44) | DNM1EPHX1ADH1BADH1CADH1A | |
| SCHEMBL27774878 | 0.77 | EPHX1 (0.44) | DNM1EPHX1ADH1BADH1CADH1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9315670-B2 | Composition for forming resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-20140235796-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-21 | — | — | US | disclosed |