SCHEMBL15967403

SCHEMBL15967403

C1#CC(C2CCCC2)CC1

nearest known ligand 0.37

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1399963 0.92 ALDH1A1 (0.35) ALDH1A1
SCHEMBL15967407 0.86 ALDH1A1 (0.35) ALDH1A1
SCHEMBL8362138 0.84 ALDH1A1 (0.33) ALDH1A1
SCHEMBL8362507 0.84 ALDH1A1 (0.33) ALDH1A1
SCHEMBL8358120 0.84 ALDH1A1 (0.33) ALDH1A1
SCHEMBL2586126 0.84 ALDH1A1 (0.33) ALDH1A1
SCHEMBL2362556 0.84 ALDH1A1 (0.33) ALDH1A1
SCHEMBL30849072 0.74
SCHEMBL1286863 0.74
Methyl Alcohol SCHEMBL29212516 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2202577-B1 Chemically amplified positive resist composition and resist patterning process SHINETSU CHEMICAL CO (JP) 2014-08-27 EP claimed