⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17069791 | 0.94 | TSHR (0.33) | — | |
| SCHEMBL13770597 | 0.85 | TDP1 (0.35) | — | |
| SCHEMBL8776586 | 0.84 | MEN1 (0.30) | — | |
| SCHEMBL36601 | 0.82 | TSHR (0.38) | — | |
| SCHEMBL13721129 | 0.81 | TSHR (0.37) | — | |
| SCHEMBL3161401 | 0.81 | TSHR (0.37) | — | |
| SCHEMBL12200957 | 0.80 | CHRNA7 (0.39) | — | |
| Methoxymethane SCHEMBL28253297 | 0.79 | TSHR (0.36) | — | |
| SCHEMBL7199075 | 0.78 | TSHR (0.36) | — | |
| SCHEMBL686052 | 0.78 | TSHR (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9316907-B2 | Photosensitive resin composition and uses thereof | CHI MEI CORPORATION (TW) | 2016-04-19 | — | — | US | disclosed |
| US-9316907-B2 | Photosensitive resin composition and uses thereof | CHI MEI CORPORATION (TW) | 2016-04-19 | — | — | US | disclosed |
| US-20140255845-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2014-09-11 | — | — | US | disclosed |
| US-20140255845-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2014-09-11 | — | — | US | disclosed |