SCHEMBL1602019

SCHEMBL1602019

CCCCCCCCC[Ti](CCCCCCCCC)(CCCCCCCCC)CCCCCCCCC

nearest known ligand 0.57

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.57
THRB P10828 1/20 0.57
DNM1 Q05193 7/20 0.42
ALDH1A1 P00352 3/20 0.42
LMNA P02545 2/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
HSD17B10 Q99714 1/20 0.42
SLC22A1 O15245 1/20 0.42
EPHX1 P07099 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11053786 1.00 TSHR (0.57) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL1203585 1.00 TSHR (0.57) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL433626 1.00 TSHR (0.57) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL9243081 1.00 TSHR (0.57) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL15194653 1.00 TSHR (0.57) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL391963 1.00 TSHR (0.57) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL7596192 0.96 TSHR (0.50) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL129869 0.85 TSHR (0.46) TSHRTHRBDNM1ALDH1A1LMNA
Bromide SCHEMBL31355455 0.81 TSHR (0.43) TSHRTHRBDNM1ALDH1A1LMNA
Water SCHEMBL5691760 0.81 TSHR (0.43) TSHRTHRBDNM1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1031385-A2 Chemically adsorbed film, method of manufacturing the same, and chemical absorption solution used for the same Matsushita Electric Industrial Co., Ltd. (JP) 2000-08-30 EP claimed
EP-0826430-A2 Chemically adsorbed film, method of manufacturing the same, and chemical adsorption solution used for the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1998-03-04 EP claimed
US-9447284-B2 Water repellent glass plates EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2016-09-20 US disclosed
US-9330807-B2 Conductive paste and method for manufacturing the same, wiring using the conductive paste and method for manufacturing the same EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2016-05-03 US disclosed
US-9228035-B2 Photo-curable nanoimprint composition, method for formatting pattern using the composition, and nanoimprint replica mold comprising cured product of the composition TOKUYAMA CORPORATION (JP) 2016-01-05 US disclosed
US-9180206-B2 Pharmaceutical preparation and manufacturing method thereof EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2015-11-10 US disclosed
US-9177819-B2 Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPORATION (JP) 2015-11-03 US disclosed
US-20140349485-A1 METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE TOKUYAMA CORPORATION a corporation 2014-11-27 US disclosed
US-20140077137-A1 CONDUCTIVE PASTE AND METHOD FOR MANUFACTURING THE SAME, WIRING USING THE CONDUCTIVE PASTE AND METHOD FOR MANUFACTURING THE SAME EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2014-03-20 US disclosed
US-8658888-B2 Solar energy utilization device and method for manufacturing the same EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2014-02-25 US disclosed
US-8623500-B2 Conductive paste and method for manufacturing the same, wiring using the conductive paste and method for manufacturing the same EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2014-01-07 US disclosed
EP-1293198-A1 Device for transdermal administration for the treatment of urinary tract disorders SCHWARZ PHARMA AG (DE) 2003-03-19 EP disclosed
EP-1031385-A2 Chemically adsorbed film, method of manufacturing the same, and chemical absorption solution used for the same Matsushita Electric Industrial Co., Ltd. (JP) 2000-08-30 EP disclosed
US-6013331-A PROVIDED BY ADDING THE SAME TYPE OF A SILANE CROSSLINKING AGENT AS A CHEMICAL ADSORBENT IN A CHEMICAL ADSORPTION SOLUTION IN FILM-FORMING PROCESSES, AND THEN BY CROSSLINKING ADSORBED MOLECULES MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2000-01-11 US disclosed
EP-0826430-A2 Chemically adsorbed film, method of manufacturing the same, and chemical adsorption solution used for the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1998-03-04 EP disclosed
US-5594079-A COORDINATION CATALYST CONTAINING BORON, STEREOREGULAR POLYPROPYLENE TOSOH CORPORATION (JP) 1997-01-14 US disclosed
EP-0251161-B1 METHOD OF MANUFACTURING EXTRUDED PRODUCT OF FIRE-RETARDANT CROSSLINKED POLYOLEFIN COMPOSITION THE FURUKAWA ELECTRIC CO., LTD. (JP) 1993-03-17 EP disclosed
US-4814130-A UNSATURATED ALKOXY SILANE THE FURUKAWA ELECTRIC CO., LTD. (JP) 1989-03-21 US disclosed
EP-0251161-A2 Method of manufacturing extruded product of fire-retardant crosslinked polyolefin composition THE FURUKAWA ELECTRIC CO., LTD. (JP) 1988-01-07 EP disclosed
US-4412042-A SOLVENT-FREE, VAPOR PHASE POLYMERIZATION OF ETHYLENE AND A-OLEFIN IN PRESENCE OF CATALYSTS, THEN REACTION WITH SILANE COMPOUND NIPPON OIL COMPANY, LIMITED (JP) 1983-10-25 US disclosed