SCHEMBL7596192

SCHEMBL7596192

CCCCC[Ti](CCCCC)(CCCCC)CCCCC

nearest known ligand 0.50

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.50
THRB P10828 1/20 0.50
LMNA P02545 3/20 0.43
SLC22A1 O15245 3/20 0.39
SLC22A2 O15244 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
DNM1 Q05193 5/20 0.37
ALDH1A1 P00352 3/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
HSD17B10 Q99714 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL391963 0.96 TSHR (0.57) TSHRTHRBLMNASLC22A1DNM1
SCHEMBL433626 0.96 TSHR (0.57) TSHRTHRBLMNASLC22A1DNM1
SCHEMBL1602019 0.96 TSHR (0.57) TSHRTHRBLMNASLC22A1DNM1
SCHEMBL11053786 0.96 TSHR (0.57) TSHRTHRBLMNASLC22A1DNM1
SCHEMBL1203585 0.96 TSHR (0.57) TSHRTHRBLMNASLC22A1DNM1
SCHEMBL15194653 0.96 TSHR (0.57) TSHRTHRBLMNASLC22A1DNM1
SCHEMBL9243081 0.96 TSHR (0.57) TSHRTHRBLMNASLC22A1DNM1
SCHEMBL129869 0.88 TSHR (0.46) TSHRTHRBLMNASLC22A1SLC22A2
SCHEMBL30427381 0.85 TSHR (0.43) TSHRTHRBLMNASLC22A1SLC22A2
Bromide SCHEMBL31355455 0.85 TSHR (0.43) TSHRTHRBLMNASLC22A1SLC22A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117396581-A Stable AIGS film 纳米系统公司 2024-01-12 CN disclosed
US-9228035-B2 Photo-curable nanoimprint composition, method for formatting pattern using the composition, and nanoimprint replica mold comprising cured product of the composition TOKUYAMA CORPORATION (JP) 2016-01-05 US disclosed
US-9177819-B2 Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPORATION (JP) 2015-11-03 US disclosed
US-20140349485-A1 METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE TOKUYAMA CORPORATION a corporation 2014-11-27 US disclosed
EP-2631932-A1 PHOTO-CURABLE NANOIMPRINT COMPOSITION, METHOD FOR FORMING PATTERN USING THE COMPOSITION, AND NANOIMPRINT REPLICA MOLD COMPRISING CURED PRODUCT OF COMPOSITION Tokuyama Corporation (JP) 2013-08-28 EP disclosed
US-20130214453-A1 PHOTO-CURABLE NANOIMPRINT COMPOSITION, METHOD FOR FORMATING PATTERN USING THE COMPOSITION, AND NANOIMPRINT REPLICA MOLD COMRISING CURED PRODUCT OF THE COMPOSITION TOKUYAMA CORPORATION (JP) 2013-08-22 US disclosed
EP-0694563-B1 Olefin polymerization catalyst and process for preparing polyolefins NIPPON MITSUBISHI OIL CORP (JP) 2002-10-30 EP disclosed
US-6077804-A Olefin polymerization catalyst and process for preparing polyolefins NIPPON OIL COMPANY, LIMITED (JP) 2000-06-20 US disclosed
EP-0679662-B1 Catalyst component for the polymerization of olefins NIPPON OIL CO LTD (JP) 1999-07-14 EP disclosed
US-5780562-A GROUP 4 METAL ALKOXIDE DERIVATIVES COMPLEXED WITH GROUP 1-3 METAL ALKOXIDE DERIVATIVES, ORGANOCYCLIC COMPOUNDS HAVING CONJUGATED BONDS, ALUMOXANES, AND A SLILICA OR ALUMINA NIPPON OIL CO., LTD. (JP) 1998-07-14 US disclosed
US-5728641-A Catalyst component for the polymerization of olefins NIPPON OIL COMPANY, LIMITED (JP) 1998-03-17 US disclosed
EP-0694563-A1 Olefin polymerization catalyst and process for preparing polyolefins NIPPON OIL COMPANY, LIMITED (JP) 1996-01-31 EP disclosed
EP-0679662-A1 Catalyst component for the polymerization of olefins NIPPON OIL CO. LTD. (JP) 1995-11-02 EP disclosed